S
Sven Ulrich
Researcher at Karlsruhe Institute of Technology
Publications - 134
Citations - 2589
Sven Ulrich is an academic researcher from Karlsruhe Institute of Technology. The author has contributed to research in topics: Thin film & Sputter deposition. The author has an hindex of 26, co-authored 124 publications receiving 2191 citations. Previous affiliations of Sven Ulrich include RWTH Aachen University.
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Journal ArticleDOI
Development of thin film cathodes for lithium-ion batteries in the material system Li–Mn–O by r.f. magnetron sputtering
Julian Fischer,C. Adelhelm,Thomas Bergfeldt,Keke Chang,Carlos Ziebert,Harald Leiste,Michael Stüber,Sven Ulrich,Denis Music,Bengt Hallstedt,H.J. Seifert +10 more
TL;DR: In this paper, cubic-LiMn2O4 spinel, monoclinic-Li2MnO3 and orthorhombic-LMCO2 thin films have been synthesized by non-reactive r.f. magnetron sputtering from two ceramic targets (liMn 2 O4, LiMn O2) in a pure argon discharge.
Journal ArticleDOI
3D Structures in Battery Materials
TL;DR: In this article, thin film electrodes based on lithium manganese oxide compounds were deposited by radiofrequency magnetron sputtering on steel and silicon substrates within a new technical approach, UV-laser process technologies using a wavelength of 248 nm were applied in order to form three-dimensional cathode structures.
Journal ArticleDOI
Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization
M. D. Tucker,R. Ganesan,Dougal G. McCulloch,Jim G. Partridge,Michael Stueber,Sven Ulrich,Marcela M.M. Bilek,David R. McKenzie,Nigel A. Marks +8 more
TL;DR: In this article, high-power impulse magnetron sputtering (HiPIMS) is used to deposit amorphous carbon thin films with sp3 fractions of 13% to 82%.
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Synthesis of Al–Cr–O–N thin films in corundum and f.c.c. structure by reactive r.f. magnetron sputtering
TL;DR: In this paper, a combinatorial approach to the synthesis of Al-Cr-O-N thin films by means of reactive r.f. magnetron sputtering is presented, and a thorough phase analysis of deposited coatings covering a wide range of elemental compositions revealed a well-defined phase transition from a corundum-type α-(Al 1−−x,Cr x ) 2−+ ǫ (O 1−ǫ,N y ) 3 structure to a CrN-type f.c.
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Mechanical properties and performance of magnetron-sputtered graded diamond-like carbon films with and without metal additions
TL;DR: In this paper, a specific gradient in the constitution and properties of the growing film can be used to improve the mechanical properties and performance of magnetron-sputtered carbon films up to a thickness of 10 μm.