T
T.S. Chen
Publications - 2
Citations - 88
T.S. Chen is an academic researcher. The author has contributed to research in topics: Gate dielectric & Dielectric. The author has an hindex of 1, co-authored 2 publications receiving 88 citations.
Papers
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Journal ArticleDOI
Degradation of oxynitride gate dielectric reliability due to boron diffusion
TL;DR: In this article, the impact of the suppression of boron diffusion via nitridation of SiO2 on gate oxide integrity and device reliability was investigated using oxynitride gate dielectrics.
Proceedings ArticleDOI
Suppressed boron penetration in P/sup +/-poly PMOSFETs with NO-nitrided SiO/sub 2/ gate dielectrics
TL;DR: Ultrathin NO-nitrided SiO/sub 2/ has been demonstrated to be a promising gate dielectric for dual-gate CMOS to alleviate the boron penetration problem in BF/ sub 2/-implanted polysilicon gated p-MOSFETs.