T
T. Vogel
Researcher at Ruhr University Bochum
Publications - 4
Citations - 169
T. Vogel is an academic researcher from Ruhr University Bochum. The author has contributed to research in topics: Ion implantation & Ion source. The author has an hindex of 3, co-authored 4 publications receiving 163 citations.
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Journal ArticleDOI
Towards the implanting of ions and positioning of nanoparticles with nm spatial resolution
Jan Meijer,S. Pezzagna,T. Vogel,Bernd Burchard,H.H. Bukow,Ivo W. Rangelow,Y. Sarov,Hartmut Wiggers,Ingo Plümel,Fedor Jelezko,Jörg Wrachtrup,Ferdinand Schmidt-Kaler,Wolfgang Schnitzler,Kilian Singer +13 more
TL;DR: In this paper, the authors present a technique to implant ions through a small hole in the tip of an atomic force microscope. But this technique is not suitable for the handling of small structures using different projectiles at kinetic energies between 0.5 and 5.0 keV.
Journal ArticleDOI
Concept of deterministic single ion doping with sub-nm spatial resolution
Jan Meijer,T. Vogel,Bernd Burchard,Ivo W. Rangelow,L. Bischoff,Jörg Wrachtrup,M. Domhan,Fedor Jelezko,Wolfgang Schnitzler,Stephan Schulz,Kilian Singer,Ferdinand Schmidt-Kaler +11 more
TL;DR: In this paper, a linear ion trap is used as an ion source for deterministic implantation of single atoms into solids, allowing a deterministic control of the number of implanted atoms and a spatial resolution of less than 1 nm.
Journal ArticleDOI
Micromachined piezoresistive proximal probe with integrated bimorph actuator for aligned single ion implantation
Arun Persaud,K. Ivanova,Y. Sarov,Tzv. Ivanov,B. E. Volland,Ivo W. Rangelow,N. Nikolov,Thomas Schenkel,V. Djakov,D. W. K. Jenkins,J. Meijer,T. Vogel +11 more
TL;DR: In this article, a self-actuated piezoresistive scanning probe (SAPSP) was designed for a single ion implantation in ultrahigh vacuum, and an integrated hollow pyramid was constructed to suppress secondary particles from the back side of the cantilever.
Journal ArticleDOI
Concept of deterministic single ion doping with sub-nm spatial resolution
Jan Meijer,T. Vogel,Bernd Burchard,Ivo W. Rangelow,L. Bischoff,Jörg Wrachtrup,M. Domhan,Fedor Jelezko,Wolfgang Schnitzler,Stephan Schulz,Kilian Singer,Ferdinand Schmidt-Kaler +11 more
TL;DR: In this paper, a linear ion trap is used as an ion source for deterministic implantation of single atoms into solids, allowing a deterministic control of the number of implanted atoms and a spatial resolution of less than 1 nm.