T
Takayuki Kitamura
Researcher at Kyoto University
Publications - 504
Citations - 7001
Takayuki Kitamura is an academic researcher from Kyoto University. The author has contributed to research in topics: Fracture mechanics & Ferroelectricity. The author has an hindex of 39, co-authored 503 publications receiving 6117 citations. Previous affiliations of Takayuki Kitamura include Osaka University & Glenn Research Center.
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Application of poly(3,4-ethylenedioxythiophene) to counter electrode in dye-sensitized solar cells
TL;DR: Dye-sensitized solar cells fabricated using chemically polymerized poly(3,4-ethylenedioxythiophene) on a conductive glass as a counter electrode showed comparable conversion efficiency with a cell using platinum sputtered counter electrode as mentioned in this paper.
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Hierarchical chirality transfer in the growth of Towel Gourd tendrils.
Jian-Shan Wang,Gang Wang,Xi-Qiao Feng,Takayuki Kitamura,Yi Lan Kang,Shou Wen Yu,Qing-Hua Qin +6 more
TL;DR: Investigating how the Towel Gourd tendrils achieve their chiral growth suggests that chirality transfer can be utilized in the development of hierarchically chiral materials having unique properties and helps understand various chiral phenomena observed in biological materials.
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Application of J-Integral to High-Temperature Crack Propagation: Part I—Creep Crack Propagation
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Observation of neodymium electroluminescence
Yuichiro Kawamura,Yuji Wada,Yasuchika Hasegawa,Mitsunori Iwamuro,Takayuki Kitamura,Shozo Yanagida +5 more
TL;DR: In this article, an organic electroluminescence device using a neodymium(III) complex as an emitting layer was fabricated and the cell structure of glass substrate/indium-tin-oxide/N,N′-diphenyl-N, N′-di(m-tolyl)-benzidine/tris(dibenzoylmethanato)(monobathophenanthroline)neodymiam(III), tris(8-quinolinolato)aluminum(III)-complex/
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Effect of residual stress on delamination from interface edge between nano-films
TL;DR: In this article, the effect of residual stress on the delamination crack initiation from the interface edge between thin films, where the stress is intensified by the free edge effect, was analyzed. And the authors showed that the residual stress increases with the increase of film thickness and remarkably intensifies the stress near the edge.