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Showing papers by "Thomas F. Kuech published in 1986"


Journal ArticleDOI
TL;DR: In this article, photoluminescence spectroscopy was employed to determine the temperature dependence of the interdiffusion coefficient of Al and Ga in GaAs/Al03Ga07As quantum wells.
Abstract: We have employed photoluminescence spectroscopy to determine the temperature dependence of the interdiffusion coefficient of Al and Ga in GaAs/Al03Ga07As quantum wells The position of the photoluminescence peaks, due to the n=1 electron to heavy‐hole transition, was measured before and after annealing the samples A variational calculation was employed to determine the expected position of these photoluminescence peaks and from this a value of the interdiffusion coefficient was extracted The interdiffusion process is characterized by an activation energy of about 6 eV leading to an interdiffusion coefficient at 850 °C of 4×10−19 cm2/s This technique allows for the measurement of small diffusion coefficients in a wide variety of material systems

226 citations


Journal ArticleDOI
Thomas F. Kuech1, E. Veuhoff1, Tung-Sheng Kuan1, Vaughn R. Deline1, R. Potemski1 
TL;DR: In this article, a comparison study was carried out on the influence of the growth chemistry on the properties of Al x Ga 1−x As and GaAs layers and quantum well structures and the observed change in carbon incorporation with growth chemistry indicates a change in the decomposition kinetics and mechanisms between the various growth precursors.

142 citations


Journal ArticleDOI
TL;DR: In this article, the pressure dependence of quantum-well bound states formed in the GaAs/AlxGa1−xAs heterostructure system was investigated using photoluminescence (8 K) and in full-scale pseudopotential calculation.
Abstract: We report experiment and theory on the pressure dependence of quantum‐well bound states formed in the GaAs/AlxGa1−xAs heterostructure system. Using MQW’s and SL’s of various barrier compositions x, we trace in photoluminescence (8 K), and in full‐scale pseudopotential calculation, the pressure‐induced evolution of the lowest spatially confined states within the wells. With increasing pressure Γ‐confined states follow the shift to higher energies of the direct GaAs band gap. At critical pressures a crossing occurs between these Γ bound states and the barrier indirect X states. Here, Γ intensities plunge and new emission tracking the X edges appears. Confirmed in wave function calculation, these new transitions occur across the heterointerface, between X‐confined electrons within the AlxGa1−xAs and Γ‐confined holes within the GaAs. Arising from valence‐offset‐induced staggered band alignment, critical pressures for observation of these states decrease with increasing Al mole fraction. We thus obtain, with p...

122 citations


Journal ArticleDOI
Thomas F. Kuech1, E. Marshall1, G.J. Scilla1, R. Potemski1, C.M. Ransom1, M.Y. Hung1 
TL;DR: In this article, a Br-based in-situ vapor etch prior to growth has been developed to substantially improve the electrical behavior of these interfaces, and the removal of only ~ 0.02 μm of surface through the vapor at 800°C is sufficient to reduce the trap density.

24 citations



Journal ArticleDOI
TL;DR: In this article, photoluminescence spectroscopy was employed to determine the interdiffusion of Al and Ga in (Al,Ga)As/GaAs quantum wells.
Abstract: We have employed photoluminescence spectroscopy to determine the interdiffusion of Al and Ga in (Al,Ga)As/GaAs quantum wells. The luminescence due to the n=l electron to heavy hole transition in these wells before and after anneal was measured. A variational calculation was employed to determine the expected position of this luminescence peak both before and after the anneal. A single diffusion coefficient, D , was used to model the interdiffusion of the Al and Ga and from the shifted position of the luminescence peaks under various anneal conditions of time and temperature its value was determined. These measurements were performed as a function of temperature to yield ΔE where D = D 0 e -ΔE/KT. This diffusion coefficient was also studied as a function of the initial Al composition in the cladding layers which ranged from 0.3 to 1.0.

3 citations


Patent
Jeffrey A. Kash1, Thomas F. Kuech1
03 Jun 1986
TL;DR: In this paper, a textured layer of GaAs was grown on a hexagonal monocrystalline Al₂O₃ substrate, having domains approximately 1.0 micron with a carrier lifetime about 5 picoseconds and a carrier mobility of about 80 cmµ voltµ secµ.
Abstract: Picosecond response photoconductors and photoresponsive elements can be provided that retain high carrier mobility and yet have short lifetime by providing on a crystal mismatched substrate (1) a textured layer (2) of domain regions (3) wherein the domain size is such that the lifetime (t) is proportional to the square of the size (S²) divided by the diffusion coefficient (D) of the semiconductor (i.e. t ≈ S²/D) material. The crystalline orientation in the domains with respect to the substrate is maintained. An embodiment is an approximately 0.1 micron thick textured layer of GaAs (2) grown on a hexagonal monocrystalline Al₂O₃ substrate (1) having domains approximately 1.0 micron with a carrier lifetime about 5 picoseconds and a carrier mobility of about 80 cm² volt⁻¹ sec⁻¹.