V
V. Elings
Researcher at Veeco
Publications - 33
Citations - 6969
V. Elings is an academic researcher from Veeco. The author has contributed to research in topics: Conductive atomic force microscopy & Magnetic force microscope. The author has an hindex of 23, co-authored 33 publications receiving 6766 citations.
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Journal ArticleDOI
Reproducible Imaging and Dissection of Plasmid DNA Under Liquid with the Atomic Force Microscope
Helen G. Hansma,James Vesenka,C. Siegerist,G.L. Kelderman,H. Morrett,Robert L. Sinsheimer,V. Elings,Carlos Bustamante,Paul K. Hansma +8 more
TL;DR: Reproducible images of uncoated DNA in the atomic force microscope (AFM) have been obtained by imaging plasmid DNA on mica in n-propanol by increasing the force applied by the AFM tip at selected locations.
Journal ArticleDOI
Using force modulation to image surface elasticities with the atomic force microscope
P. Maivald,Hans-Jürgen Butt,Scot A. C. Gould,Craig Prater,Barney Drake,J. Gurley,V. Elings,Paul K. Hansma +7 more
TL;DR: In this paper, a new contrast mechanism relies on variation in the surface elasticity of a carbon fiber and epoxy composite is used to reveal contrast between the two materials, and a lateral modulation mode is employed to highlight atomic steps in gold.
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Atomic-Resolution Electrochemistry with the Atomic Force Microscope: Copper Deposition on Gold
TL;DR: The atomic force microscope (AFM) was used to image an electrode surface at atomic resolution while the electrode was under potential control in a fluid electrolyte and revealed that the underpotential-deposited monolayer has different structures in different electrolytes.
Journal ArticleDOI
How to measure energy dissipation in dynamic mode atomic force microscopy
TL;DR: In this article, the energy dissipated by the tip-sample interaction was measured by measuring such quantities as oscillation amplitude, frequency, phase shift and drive amplitude, which is applicable to a variety of scanning probe microscopes operating in different dynamic modes.
Journal ArticleDOI
Near-field photolithography with a solid immersion lens
L. P. Ghislain,V. Elings,Kenneth B. Crozier,Scott R. Manalis,Stephen C. Minne,Kathryn Wilder,Gordon S. Kino,Calvin F. Quate +7 more
TL;DR: In this article, a solid immersion lens (SIL) was used to focus a laser beam (λ =442 nm) in a photoresist, which was mounted on a flexible cantilever and scanned by a modified commercial atomic force microscope.