Vassilios Constantoudis

TL;DR: Patsis et al. as mentioned in this paper analyzed the detected line edges as found from scanning electron microscope (SEM) image analysis using scaling and fractal concepts and showed that the majority of analyzed experimental edges exhibit a self-affine character and thus the suggested parameters for the description of their roughness should be: (1) the sigma value, (2) the correlation length, and (3) the roughness exponent α.

TL;DR: In this paper, the relationship between LWR and the σ of the critical dimensions of the gates to dimensions of a few tens of nanometers has been investigated, and the results from the study of the height-height correlation function (HHCF), the Fourier [or power spectrum (PS)] analysis and the variation of rms value σ with measured line edge L [σ(L) curve were compared.

TL;DR: In this paper, the authors describe how plasma-wall interactions in etching plasmas lead to either random roughening/nanotexturing of polymeric and silicon surfaces, or formation of organized nanostructures on such surfaces.

TL;DR: In this article, the authors showed that with increasing plasma treatment duration, roughness increased while periodicity decreased, resulting in surfaces of enhanced surface area exploited for the enhancement and control of surface hydrophobicity when followed by Fluorocarbon (FC) film coating of the PDMS surface.

TL;DR: An improved approximative map is introduced, which takes into account the effect of the wall displacement, and in addition allows the analytical estimation of the long term behavior of the particle mean velocity as well as the corresponding probability distribution, in complete agreement with the numerical results of the exact dynamics.