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Warren B. Jackson

Researcher at PARC

Publications -  284
Citations -  12276

Warren B. Jackson is an academic researcher from PARC. The author has contributed to research in topics: Amorphous silicon & Silicon. The author has an hindex of 52, co-authored 278 publications receiving 11967 citations. Previous affiliations of Warren B. Jackson include Xerox & Hewlett-Packard.

Papers
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Journal ArticleDOI

Influence of grain boundaries on hydrogen transport in polycrystalline silicon

TL;DR: In this article, the effect of the microscopic structure of polycrystalline silicon on hydrogen transport was investigated by H and D diffusion experiments, and it was shown that poly-Si composed of columnar grains and grown by low pressure chemical vapor deposition (LPCVD-grown) exhibits enhanced diffusion compared to solid-state crystallized (SSC) polypoly-Si.
Journal ArticleDOI

Stability of Amorphous Silicon Thin Film Transistors under Prolonged High Compressive Strain

TL;DR: In this paper, the effect of prolonged mechanical strain on the electrical characteristics of thin-film transistors of hydrogenated amorphous silicon made at a process temperature of 150oC on 51-µm thick Kapton polyimide foil substrates was studied.
Journal ArticleDOI

The effect of post-hydrogenation on the equilibrium and metastable properties of hydrogenated amorphous silicon

TL;DR: In this paper, the defect densities in the annealed state, after illumination and after deuteration were determined using CPM measurements following each exposure sequence, and it was shown that an increase of the concentration of Si-H bonds by as much as 3 × 1021cm−3 changes neither the defect density, the weak Si-Si bond density nor the defect metastability.
Book ChapterDOI

Flexible Transition Metal Oxide Electronics and Imprint Lithography

TL;DR: In this paper, a transition metal oxides (TMO) based high-performance flexible electronic materials system is presented, which can be used to drive organic light-emitting diodes (OLEDs) as well as create electronic circuits, such as shift registers, ring oscillators, and multiplexers on chip.
Proceedings ArticleDOI

Roll-to-roll fabrication and metastability in metal oxide transistors

TL;DR: In this article, self-aligned imprint lithography (SAIL) was used to pattern amorphous silicon and amorphized multicomponent oxide (MCO) transistors on flexible substrates.