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X. J. Li
Researcher at Northwest University (China)
Publications - 7
Citations - 127
X. J. Li is an academic researcher from Northwest University (China). The author has contributed to research in topics: Graphene & Electron mobility. The author has an hindex of 3, co-authored 5 publications receiving 102 citations.
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Facile hydrothermal fabrication of nitrogen-doped graphene/Fe2O3 composites as high performance electrode materials for supercapacitor
TL;DR: In this paper, a simple hydrothermal method was used to synthesize nitrogen-doped graphene/Fe 2 O 3 composites (NGFeCs) and the structure and morphology of these composites were analyzed by X-ray diffraction, Raman spectra, scanning electron microscopy, transmission electron microscope, and Xray photoelectron spectroscopy.
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Study on temperature-dependent carrier transport for bilayer graphene
TL;DR: In this paper, the authors investigated the temperature-dependent carrier transport property of the bilayer graphene, synthesized on Cu foils by a home-built chemical vapor deposition (CVD) with C 2 H 2.
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An Experimental Study on Unipolar Induction
TL;DR: In this article, an experiment of inversely rotating double Faraday disks and double magnets is designed, and the unipolar induction phenomenon is verified by means of theoretical calculation and experiment, that is to say, the magnetic field does not rotate when the magnet rotates.
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The low threshold-voltage shift with temperature and small subthreshold-slope in 28 nm UTBB FDSOI for 300 °C high-temperature application
S. S. Zhao,Linchun Gao,X. J. Li,H. M. Zhang,T. Ni,J. Wang,J. Gao,Jianhui Bu,D. Li,Weiwei Yan,Chuanbin Zeng,Z. Wang,F. Zhao,J. J. Luo,Z.-S. Han +14 more
TL;DR: In this paper , the high-temperature characteristics of 28 nm ultra-thin body and box fully depleted SOI (FDSOI) CMOS transistors with low threshold voltage (LVT) structure were reported.
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Research on Hall Effect of Graphene by Var Der Pauw Method
TL;DR: In this article, electrical conductivity and Hall effect of the graphene were measured at room temperature by Var der Pauw method and the results showed that the Hall coefficient RH is 7.00*10-7 m3/C; the carrier concentration n is 10.52*1024 m-3 that is fifteen orders of magnitude bigger than silicon; the Hall element production sensitivity KH is 6.87*102 m2/C and the carrier mobility was 1.54 cm2·V-1·s-1 which is much bigger than Silicon.