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Yifang Chen
Researcher at Fudan University
Publications - 79
Citations - 1406
Yifang Chen is an academic researcher from Fudan University. The author has contributed to research in topics: Electron-beam lithography & Resist. The author has an hindex of 11, co-authored 74 publications receiving 1048 citations. Previous affiliations of Yifang Chen include Rutherford Appleton Laboratory.
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Nanofabrication by electron beam lithography and its applications
TL;DR: In this article, a review of electron beam lithography (EBL) based nanofabrication techniques for pattern transfer is presented, focusing on how to apply the property of EBL resists for constructing multilayer stacks towards pattern transfer.
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Focusing of light by a nanohole array
TL;DR: In this paper, a conceptually new mechanism for focusing at optical frequencies based upon the use of nano-hole quasi-periodic arrays in metal screens was demonstrated, using coherent illumination at 660nm and scanning near-field optical microscopy, and even smaller hot-spots of about 200nm in waist were observed closer to the plane of the array.
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Nanofabrication and coloration study of artificial Morpho butterfly wings with aligned lamellae layers.
Sichao Zhang,Yifang Chen +1 more
TL;DR: A technical breakthrough to mimic the blue color of Morpho butterfly wings is reported, by developing a novel nanofabrication process, based on electron beam lithography combined with alternate PMMA/LOR development/dissolution, for photonic structures with aligned lamellae multilayers in colorless polymers.
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Controlling the Colour of Metals: Intaglio and Bas-Relief Metamaterials
Jianfa Zhang,Yifang Chen,Nikolay I. Zheludev,Kevin F. MacDonald,Jun-Yu Ou,Nikitas Papasimakis +5 more
TL;DR: This work shows that periodic structuring of a metal film without violation of continuity (i.e. without perforation) is sufficient to achieve substantial modification of reflectivity in the optical part of the spectrum.
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High-resolution plasmonic structural colors from nanohole arrays with bottom metal disks.
TL;DR: Transmissive plasmonic structural colors from subwavelength nanohole arrays with bottom metal disks for scaled-up manufacturing by nanoimprint lithography (NIL) are presented with potential applications, including color filters and displays, high-resolution color printing, CMOS color imaging, and anti-counterfeiting.