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Yifang Chen

Researcher at Fudan University

Publications -  79
Citations -  1406

Yifang Chen is an academic researcher from Fudan University. The author has contributed to research in topics: Electron-beam lithography & Resist. The author has an hindex of 11, co-authored 74 publications receiving 1048 citations. Previous affiliations of Yifang Chen include Rutherford Appleton Laboratory.

Papers
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Journal ArticleDOI

Remarkable optical coupling enhancement with laser selective focusing devices

TL;DR: In this paper, two kinds of Fresnel zone plates (FZPs) have been employed as optical coupling devices to enhance the response of versatile laser detection systems, and the simulation and experiment results indicate that the FZPs have selective focusing abilities for wavelength and coherence of the incident lights, which contributes to high collection efficiency to the laser signals and suppression to the ambient lights.
Proceedings ArticleDOI

Nanofabrication of templates with ultra sharp SiC tips for nanoimprint lithography

TL;DR: In this paper, a nanofabrication process for the fabrication of SiC nanoimprint templates with ultra sharp tip arrays is described, and the resulting SiC tips are not only of high resolution for nano-imprint lithography, but also of high hardness for high pressure lithography process.
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Optimization study of metallic hole arrays as the multi-channel spectral filters in long-infrared wavelengths.

TL;DR: The effects of structural parameters and the shapes of metallic hole arrays on filtering performance are investigated by numerical simulations with the finite-difference time-domain method and then experimentally verified by optical characterizations of fabricated filters using electron beam lithography.
Journal ArticleDOI

Nanofabrication and characterization of a grating-based condenser for uniform illumination with hard X-rays.

TL;DR: This paper describes in more detail the development of such a beam shaper for hard X-rays at 10 keV with regard to its design, manufacture and optical characterization.
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A novel and reliable approach for controlling silicon membrane thickness with smooth surface

TL;DR: Wang et al. as discussed by the authors developed a reliable approach to control the membrane thickness in the precision of micrometer order by using an optical detection hole with high precision depth, which decides the surface roughness in the Si thinning process.