Y
Yong Seung Kim
Researcher at Sejong University
Publications - 31
Citations - 2109
Yong Seung Kim is an academic researcher from Sejong University. The author has contributed to research in topics: Graphene & Graphene nanoribbons. The author has an hindex of 17, co-authored 31 publications receiving 1822 citations. Previous affiliations of Yong Seung Kim include Rutgers University.
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Journal ArticleDOI
Thickness-Independent Transport Channels in Topological Insulator Bi 2 Se 3 Thin Films
TL;DR: In this paper, the authors report thickness-independent transport properties over wide thickness ranges and identify two surface channels of very different behaviors, which are consistent with the topological surface states and the surface accumulation layers.
Journal ArticleDOI
Bright visible light emission from graphene
Young Duck Kim,Hakseong Kim,Yujin Cho,Ji Hoon Ryoo,Cheol-Hwan Park,Pilkwang Kim,Yong Seung Kim,Sunwoo Lee,Yilei Li,Seung Nam Park,Yong Shim Yoo,Duhee Yoon,Vincent E. Dorgan,Eric Pop,Tony F. Heinz,James Hone,Seung-Hyun Chun,Hyeonsik Cheong,Sangwook Lee,Myung-Ho Bae,Yun Daniel Park +20 more
TL;DR: Hot electrons become spatially localized at the centre of the graphene layer, resulting in a 1,000-fold enhancement in thermal radiation efficiency and paving the way towards the realization of commercially viable large-scale, atomically thin, flexible and transparent light emitters and displays with low operation voltage and graphene-based on-chip ultrafast optical communications.
Journal ArticleDOI
Thickness-dependent bulk properties and weak antilocalization effect in topological insulator Bi 2 Se 3
Yong Seung Kim,Yong Seung Kim,Matthew Brahlek,Namrata Bansal,Eliav Edrey,Gary A. Kapilevich,K. Iida,Makoto Tanimura,Yoichi Horibe,Sang-Wook Cheong,Seongshik Oh +10 more
TL;DR: In this article, a number of transport properties in topological insulator (TI) Bi{}_{2}$Se${}_{3}$ exhibit striking thickness dependences over a range of up to five orders of thickness (3 nm--170 \ensuremath{\mu}m).
Journal ArticleDOI
Epitaxial growth of topological insulator Bi2Se3 film on Si(111) with atomically sharp interface
Namrata Bansal,Yong Seung Kim,Eliav Edrey,Matthew Brahlek,Yoichi Horibe,K. Iida,Makoto Tanimura,Guohong Li,Tian Feng,Hang Dong Lee,Torgny Gustafsson,Eva Y. Andrei,Seongshik Oh +12 more
TL;DR: In this article, a two-phase growth process was proposed to achieve interfacial-layer-free epitaxial growth of Bi 2 Se 3 films on Si substrates, where a low temperature initial growth followed by a high temperature growth, second-phase-free atomically sharp interface was obtained between Bi 2 SE 3 and Si substrate, as verified by reflection high energy electron diffraction (RHEED), transmission electron microscopy (TEM) and X-ray diffraction.
Journal ArticleDOI
Nanocrystalline Graphite Growth on Sapphire by Carbon Molecular Beam Epitaxy
Sahng-Kyoon Jerng,D. S. Yu,Yong Seung Kim,Junga Ryou,Suklyun Hong,C. Kim,Seokhyun Yoon,Dmitri K. Efetov,Philip Kim,Seung-Hyun Chun +9 more
TL;DR: In this paper, the fabrication of nanocrystalline graphite films on sapphire substrates of various cutting directions by using solid carbon source molecular beam epitaxy was reported.