Z
Zhechao Wang
Researcher at Ghent University
Publications - 83
Citations - 2118
Zhechao Wang is an academic researcher from Ghent University. The author has contributed to research in topics: Silicon photonics & Silicon. The author has an hindex of 19, co-authored 82 publications receiving 1823 citations. Previous affiliations of Zhechao Wang include Zhejiang University & IMEC.
Papers
More filters
Proceedings ArticleDOI
InP nanowire lasers epitaxially grown on (001) silicon ‘V-groove’ templates
Bin Tian,Zhechao Wang,Marianna Pantouvaki,W Guo,Joris Van Campenhout,Merckling Clement,Dries Van Thourhout +6 more
TL;DR: In this article, an ultra-low threshold nanowire laser monolithically integrated on a (001) silicon substrate was demonstrated and the V-groove template was used to reduce the laser threshold by one order of magnitude.
Proceedings ArticleDOI
Interfacing of silicon-on-insulator nanophotonic circuits to the real world
TL;DR: Besides much higher demands for fabrication accuracy, high refractive index contrast introduces additional optical input/output coupling problems as well as much higher polarization sensitivity of nanophotonic structures.
Proceedings ArticleDOI
A sub-wavelength microdisk resonator based on hybrid plasmonic waveguides
TL;DR: Based on hybrid plasmonic waveguides, microdisk resonators with radii of 0.5 µm and FSRs of about 200 nm were simulated and experimentally demonstrated in this paper.
Proceedings ArticleDOI
An ultrasmall polarization rotator based on Si nanowire
Zhechao Wang,Daoxin Dai +1 more
TL;DR: In this paper, an ultrasmall polarization rotator based on asymmetrical Si nanowires is presented, which achieves almost 100% polarization rotation with a very small beat length (~10 m).
Proceedings ArticleDOI
A monolithic integration platform for silicon photonics
TL;DR: In this article, a novel epitaxial lateral overgrowth (ELOG) technology-based monolithic integration platform for silicon photonics is demonstrated, where high quality, defect-free InP ELOG mesa is obtained on silicon by using hydride vapor phase epitaxy (HVPE).