Patent
A system and method for analyzing topological features on a surface
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TLDR
In this paper, a method and apparatus for using far field scattered and diffracted light (412) to determine whether a collection of topological features on a surface (408) conforms to an expected condition or quality is presented.Abstract:
Disclosed is a method and apparatus for using far field scattered and diffracted light (412) to determine whether a collection of topological features on a surface (408), (e.g. a semiconductor wafer) conforms to an expected condition or quality. This determination is made by comparing the far field diffraction pattern of a surface under consideration with a corresponding diffraction pattern (a 'baseline'). If the baseline diffraction pattern and far field diffraction pattern varies by more than a prescribed amount or in characteristic ways, it is inferred that the surface (408) features are defective. The method may be implemented as a die-to-die comparison of far field diffraction patterns of two dies on a semiconductor wafer. The portion of the far field scattered and diffracted light (412) sensitive to a relevant condition or quality can also be reimaged to obtain an improved signal-to-noise ratio.read more
Citations
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References
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Patent
Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
TL;DR: In this paper, a focusing apparatus has a first detection system having a detection area at a first position located outside the field of the objective optical system, a second detection system with a second detector at a second position located at a third position inside the field and spaced apart from each of the first position.
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TL;DR: In this paper, an automatic inspection system including an illuminator for illuminating a reticle or photomask to be inspected, while optically projecting a magnified image of the reticle/photomask onto a plurality of detector elements.