Patent
Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
Kenneth S. Collins,John Trow,Craig A. Roderick,Jiei Deii Pinson Za Sekando,A. Buchberger Ii Douglas,Robert P. Hartlage,Viktor Shel +6 more
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TLDR
In this article, a low-loss design for an adjustable inductance element suitable for use in parallel-resonant L-C tank circuits is described. And the application of an impedance matching circuit to a plasma process is also disclosed; in this context, a local impedance transformation circuit is used to improve power transfer to the plasma source antenna.Abstract:
The disclosure discusses impedance matching circuits based on parallel-resonant L-C tank circuits, and describes a low-loss design for an adjustable inductance element suitable for use in these parallel tank circuits. The application of an impedance matching circuit to a plasma process is also disclosed; in this context, a local impedance transformation circuit is used to improve power transfer to the plasma source antenna.read more
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Patent
System and method for dual-band antenna matching
TL;DR: In this paper, a dual-band antenna matching system and a method for dualband impedance matching are presented, which consists of accepting a frequency-dependent impedance from an antenna; and selectively supplying a conjugate impedance match for the antenna at either a first and a second communication band, or a third and a fourth communication band.
Patent
Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density
Kenneth S. Collins,Rice Michael R,John Trow,Douglas A. Buchberger,Eric Askarinam,Joshua Tsui,David W. Groechel,Raymond Hung +7 more
TL;DR: In this paper, a plasma reactor for processing a semiconductor workpiece such as a wafer, including a chamber having an overhead ceiling with a three-dimensional shape such as an hemisphere or dome, is described.
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Systems and methods for controlling output power in a communication device
TL;DR: In this article, a mismatch detector including a directional device adapted to couple signals across the device and a detector coupled to a port on the directional device and configured to measure a reflected power is presented.
Patent
Plasma reactor having an inductive antenna coupling power through a parallel plate electrode
Kenneth S. Collins,Michael R. Rice,John Trow,Douglas A. Buchberger,Eric Askarinam,Joshua Chiu-Wing Tsui,David W. Groechel,Raymond Hung +7 more
TL;DR: In this paper, a plasma reactor for processing a workpiece is embodied by a plasma workpiece, including a reactor enclosure (105) defining a processing chamber (100), a semiconductor window (110), a base (120) within the chamber, a gas inlet system (137) for admitting a plasma precursor gas into the chamber and an inductive antenna (145) adjacent a side of the semiconductor windows (110) opposite the base.
Patent
Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners
Kenneth S. Collins,Rice Michael R,Douglas A. Buchberger,Craig A. Roderick,Eric Askarinam,Gerhard M. Schneider,John Trow,Joshua Tsui,Dennis S. Grimard,Gerald Zheyao Yin,Robert W. Wu +10 more
TL;DR: In this article, a plasma reactor having a chamber for containing a plasma and a passageway communicating with the chamber is enhanced with a first removable plasma confinement magnet module placed adjacent the passagway including a first module housing and a first plasma confinement inside the housing.
References
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Patent
Electronically tuned matching network using predictor-corrector control system
TL;DR: In this article, an impedance matching network and a network model are used to estimate the load impedance from known present network values and a measurement of network input impedance, and to estimate optimum network values from the input impedance and the estimated load impedance.
Patent
Plasma reactor using UHF/VHF resonant antenna source, and processes
TL;DR: In this paper, a ring antenna (25) driven by RF energy (HF, VHF, or UHF) produces a circularly polarized electromagnetic wave inside the ring, this wave has a transverse circular electric field and a longitudinal magnetic field.
Patent
Automatic impedance matching between source and load
TL;DR: An R.F. generator is used to provide power to a load via a transmission line wherein load impedance is automatically matched to the surge impedance of the transmission to provide maximum transfer of energy from the generator to the load.
Patent
Tuning method and control system for automatic matching network
TL;DR: In this paper, a matching network consisting of a first variable impedance element, a second variable impedance elements, a reflected power detector and a control circuit is constructed using magnetically saturable reactors.