Journal ArticleDOI
Energy dissipation in a thin polymer film by electron beam scattering
TLDR
In this article, Monte Carlo calculations have been performed to determine the spatial distribution of energy dissipated in a 4000-A-thick film of polymethyl methacrylate (PMMA), due to an incident electron beam.Abstract:
Monte Carlo calculations have been performed to determine the spatial distribution of energy dissipated in a 4000‐A‐thick film of polymethyl methacrylate (PMMA), due to an incident electron beam. The calculations were performed for 5‐, 10‐, and 20‐keV electrons on a silicon substrate and also for 20‐keV electrons on copper and gold substrates. The effect of varying the beam diameter from 250 to 3000 A was evaluated. A detailed comparison is made between the Monte Carlo results and analytic models used to predict the energy dissipated. The plural scattering model is found to be in good agreement with the Monte Carlo calculations, whereas discrepancies are found with the multiple scattering model. The large‐angle backscattering model is found to have several important limitations. Energy dissipation is calculated for the exposure of dots, isolated lines, and arrays of closely spaced lines—geometries that are of significance in electron beam lithography.read more
Citations
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Journal ArticleDOI
Radiation Chemistry in Chemically Amplified Resists
Takahiro Kozawa,Seiichi Tagawa +1 more
TL;DR: In this article, the authors review the radiation chemistry of materials related to chemically amplified resist materials and discuss the imaging mechanisms from energy deposition to proton migration in resist materials are discussed.
Journal ArticleDOI
Monte Carlo simulation of fast secondary electron production in electron beam resists
TL;DR: In this paper, Monte Carlo calculations of fast secondary electron production have been performed with a hybrid model for the discrete and continuous energy-loss processes, which predicts a larger absorbed energy density than the old model for an isolated line source exposure on a resist film.
Journal ArticleDOI
Fabrication techniques for surface-acoustic-wave and thin-film optical devices
TL;DR: In this article, the techniques of photolithography, electron lithography, X-ray lithography and ion bombardment etching are reviewed, and their advantages and disadvantages assessed from the point of view of fabricating surface-acoustic-wave and thin-film optical devices.
Journal ArticleDOI
Electron beam lithography
TL;DR: In this paper, the authors present a method for writing patterns in thin films of electron sensitive material using a finely focused (sub-micrometre diameter) electron beam, which can be generated with great accuracy by combining electrical scanning with interferometrically monitored mechanical motion.
Journal ArticleDOI
An analytical model of SEM and STEM charge collection images of dislocations in thin semiconductor layers: I. Minority carrier generation, diffusion, and collection
TL;DR: In this article, a three-dimensional analysis is given of the generation, diffusion, and collection of minority carriers injected by an electron beam in a semiconductor containing a p-n junction parallel to the surface.
References
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Book
Fundamentals of Statistical and Thermal Physics
TL;DR: In this article, a discussion of some of the basic physical concepts and methods useful in the description of situations involving systems which consist of very many particulars is presented for the junior-senior thermodynamics course given in all departments as a standard part of the curriculum.
Fundamentals of Statistical and Thermal Physics
TL;DR: In this article, a discussion of some of the basic physical concepts and methods useful in the description of situations involving systems which consist of very many particulars is presented for the junior-senior thermodynamics course given in all departments as a standard part of the curriculum.
Journal ArticleDOI
Determination of Kilovolt Electron Energy Dissipation vs Penetration Distance in Solid Materials
T. E. Everhart,P. H. Hoff +1 more
TL;DR: In this paper, a universal curve of energy-dissipation range vs normalized electron energy is proposed, which includes the average atomic number Z of the material being bombarded in the energy normalization factor.
Related Papers (5)
Monte Carlo simulation of fast secondary electron production in electron beam resists
Determination of Kilovolt Electron Energy Dissipation vs Penetration Distance in Solid Materials
T. E. Everhart,P. H. Hoff +1 more