Patent
High resolution alignment technique and apparatus
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TLDR
In this article, a technique and apparatus for aligning a mask to a substrate with high precision using Moire fringe effects produced by superimposing diffraction gratings was provided.Abstract:
There is provided a technique and apparatus for aligning a mask to a substrate with high precision using Moire fringe effects produced by superimposing diffraction gratings. The gratings comprise first and second patterns of horizontal and vertical lines and spaces, respectively. The first pattern comprises horizontal and vertical lines and spaces of a first width. The second pattern comprises horizontal and vertical lines of a second width which differs from the lines in the first pattern by a small amount Δ. The patterns are superimposed to provide a Moire fringe effect. When alignment occurs, a symmetrical pattern is provided. If misalignment in the X, Y or θ coordinate occurs, an assymmetrical or skewed pattern of Moire fringe effects is generated.read more
Citations
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Patent
Overlay measurement technique using moire patterns
TL;DR: In this article, the Moire pattern is compared with other Moire patterns known to correspond to particular amounts of misalignment of the masks to see if it corresponds to an acceptable alignment.
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Minori Noguchi,Yukio Kenbo,Yoshitada Oshida,Masataka Shiba,Yasuhiro Yoshitake,Makoto Murayama +5 more
TL;DR: An apparatus and method for projecting a pattern includes a light source for emitting a laser; an illuminating unit which illuminates a mask on which a pattern is formed with the laser emitted from the light source and formed in a particular shape; a holder which holds the mask; an optical lens unit which projects the pattern formed on the mask onto a surface of a substrate by the laser illuminated on mask; and a table which mounts the substrate and moves in at least one direction as discussed by the authors.
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TL;DR: In this paper, the alignment pattern comprises a plurality of parallel alignment marks which are spaced from one another such that the patterns may be superimposed so that the marks of one pattern are positioned between marks of the other pattern.
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TL;DR: In this article, a method for marking a mask set to insure minimum mismatch between the masks when they are assembled into a set is presented, where each mask in the set is evaluated against a known fixed standard, identified and marked such that when the set was assembled and utilized to produce an integrated circuit minimum mismatch was realized.
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TL;DR: In this paper, photo- etch technique is used to create insular conductive film with standardized openings, which can be used directly for the exposure of a photo-sensitive film.
References
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Patent
Apparatus for measuring or setting two-dimensional position coordinates
TL;DR: In this paper, a system of two-dimensional grid markings for accurate two-coordinate identification of the instantaneous relative position of two closely spaced parallel surfaces, one of which may be on a slide-mounting base or plate, and the other of which can be viewed, as by microscope, at one or more selected regions in the field of the slide.
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TL;DR: In this paper, a device for indicating axial angular deflection between two elements is shown, where two concentric cylinders are used, each having a helical line pattern thereon and each rigidly attached to one of the elements.
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TL;DR: An automatic gain control arrangement for accurately sensing the movement of read/write heads of a memory disc pack drive mechanism is provided in this article, where a stationary table or reference has two gratings and a control grid which are positioned in the light paths extending from a plurality of light sources having corresponding sensors likewise positioned with respect to a movable grating whose movement follows that of read and write heads.
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