Patent
Mask inspection apparatus, and exposure method and mask inspection method using the same
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TLDR
In this article, a mask inspection apparatus and method capable of inspecting masks used in double patterning with satisfactory accuracy is presented. But the method is not suitable for the inspection of masks with a high level of detail.Abstract:
The present invention provides a mask inspection apparatus and method capable of inspecting masks used in double patterning with satisfactory accuracy. Optical images of two masks are acquired (S 100 ). The acquired optical images of the two masks are combined together (S 102 ). Relative positional displacement amounts of patterns of the first mask and patterns of the second mask are measured at the combined image (S 104 ). The measured relative positional displacement amounts are compared with standard values to thereby determine whether the two masks are good (S 106 ).read more
Citations
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Patent
Pattern inspection apparatus and pattern inspection method
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References
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Patent
Defect inspection method and apparatus therefor
Shunji Maeda,Atsushi Yoshida,Yukihiro Shibata,Minoru Yoshida,Sachio Uto,Hiroaki Shishido,Toshihiko Nakata +6 more
TL;DR: In this article, a defect inspection apparatus for inspecting a fine circuit pattern with high resolution to detect a defective portion is constructed to have an objective lens for detecting an image of a sample, a laser illumination unit for illuminating the sample through the objective lens, an accumulation type detector, and a unit for processing the detected image signal.
Patent
Image alignment method, comparative inspection method, and comparative inspection device for comparative inspections
TL;DR: In this article, a high-precision alignment method, device and code for inspections that compare an inspection image with a reference image and detect defects from their differences is presented, which allows high precision alignment with little or no dependency on pattern density or shape, differences in luminance between images, and uneven luminance within individual images.
Patent
Pattern inspection apparatus, corrected image generation method, and computer-readable recording medium storing program
TL;DR: A pattern inspection apparatus includes a first unit configured to acquire an optical image of a target workpiece to be inspected, a second unit configurable to generate a reference image to be compared, a third unit configured, by using a mathematical model in which a parallel shift amount, an expansion and contraction error coefficient, a rotation error coefficients, a gray-level offset and an image transmission loss ratio are parameters, to calculate each of the parameters by a least-squares method, a forth unit configures to generate the corrected image by shifting a position of the reference image by a displacement amount
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Image correcting apparatus, pattern inspection apparatus, and image correcting method, and reticle
Nobuyuki Harabe,伸之 原部 +1 more
TL;DR: In this paper, the authors proposed an image correcting apparatus consisting of an optical image acquisition unit, a reference image creation unit, and a correction model parameter identifying unit to correct a displacement or a distortion between the optical image and the reference image.
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Method for resizing pattern to be written by lithography technique, and charged particle beam writing method
TL;DR: In this paper, a method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size.
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