Patent
Method for mask inspection for mask design and mask production
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TLDR
In this article, the authors proposed a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same.Abstract:
The invention relates to a mask inspection method that can be used for the design and production of masks, in order to detect relevant weak points early on and to correct the same. According to said method for mask inspection, an aerial image simulation, preferably an all-over aerial image simulation, is carried out on the basis of the mask design converted into a mask layout, in order to determine a list of hot spots. The mask/test mask is analysed by means of an AIMS tool, whereby real aerial images are produced and compared with the simulated aerial images. The determined differences between the aerial images are used to improve the mask design. The inventive arrangement enables a method to be carried out for mask inspection for mask design and mask production. The use of the AIMS tool directly in the mask production process essentially accelerates the mask production, while reducing the error rate and cost.read more
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References
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Patent
Phase shift masking for complex patterns with proximity adjustments
TL;DR: In this paper, techniques for extending the use of phase shift techniques to implementation of masks used for complex layouts in the layers of integrated circuits, beyond selected critical dimension features, are presented.
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TL;DR: In this paper, a method and apparatus for inspecting a photolithography mask for defects is provided, which consists of providing a defect area image to an image simulator wherein the defect image is an image of a portion of a photochemical mask, and providing a set of lithography parameters as a second input to the image simulator.
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