Patent
Method and apparatus for angular-resolved spectroscopic lithography characterization
보에프 아리에 예프레이 덴,아르노 블리커,돔멜렌 유리 요한네스 로렌티우스 마리아 반,머시 두사,안토이네 가스톤 마리에 키에르스,폴 프랑크 루어맨,헨리쿠스 페트루스 마리아 펠레만스,데르 샤르 마우리츠 반,체드릭 데지레 그로우브스트라,크라이요 마르쿠스 게라르두스 마르티누스 반 +9 more
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TLDR
In this article, an apparatus and method are disclosed for determining the properties of a substrate by measuring the angle-resolved spectrum as a result of the radiation being reflected off the substrate in the pupil plane of the high numerical aperture lens.Abstract:
According to the present invention, an apparatus and method are disclosed for determining the properties of a substrate by measuring the angle-resolved spectrum as a result of the radiation being reflected off the substrate in the pupil plane of the high numerical aperture lens. The properties may be dependent on angle and wavelength and may include the intensity of TM- and TE-polarized light and their associated phase differences.read more
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Patent
Method and apparatus for angular-resolved spectroscopic lithography characterization
Arie Jeffrey Den Boef,Arno Jan Bleeker,Youri van Dommelen,Mircea Dusa,Antoine Gaston Marie Kiers,Paul Frank Luehrmann,Henricus Petrus Maria Pellemans,Maurits van der Schaar,Grouwstra Cedric Desire,Markus Gerardus Martinus Maria Van Kraaij +9 more
TL;DR: In this article, a method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate was proposed.
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