Patent
Method and apparatus for measuring the dimensions of patterned features on a lithographic photomask
TLDR
In this article, a system for inspecting and measuring the dimensions of patterned features on lithographic photomasks includes a confocal scanning microscope beneath which is mounted the photomask to be inspected.Abstract:
A system for inspecting and measuring the dimensions of patterned features on lithographic photomasks includes a confocal scanning microscope beneath which is mounted the photomask to be inspected. The photomask is moved to permit the imaging beam from the microscope to record reflectivity information at closely spaced points along a scan line at the metal-substrate interface within the photomask, and the unpatterned side of the mask is positioned facing the microscope so that the imaging beam passes through the transparent substrate material of the mask to the desired measurement plane. An objective lens specially corrected for imaging through transparent materials is used in the optical system, and compensating glass plates may be selectively placed between the objective lens and the photomask when the substrate of the mask is thinner than the thickness of transparent material for which the objective lens was corrected.read more
Citations
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Method of achieving CD linearity control for full-chip CPL manufacturing
TL;DR: In this paper, a method of generating masks for printing a pattern including a plurality of features having varying critical dimensions is proposed, which includes the steps of: (1) obtaining data representing the pattern; (2) defining a pluralityof distinct zones based on the critical dimensions of the plurality of feature; (3) categorizing each of the features into one of the distinct zones; and (4) modifying the mask pattern for each feature categorized into a predefined distinct zone of the hierarchy of distinct zones.
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Apparatus for in vivo observation of the microscopic structure of the skin or of a similar tissue
Pierre Corcuff,Jean-Luc Leveque +1 more
TL;DR: A confocal microscope equipped with a light source, a rotary disk having holes, a highly sensitive image receiver or camera, an immersion lens, and a contact endpiece for contacting the skin and in which is engaged at least a lower part of the lens as mentioned in this paper.
References
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Patent
Inspection system for array of microcircuit dies having redundant circuit patterns
TL;DR: In this article, a Fourier transform lens (34, 120) and an inverse Fourier transformation lens (54, 142) are employed along an optic axis to produce from an illuminated area of a patterned specimen wafer a spatial frequency spectrum whose frequency components can be selectively filtered to produce an image pattern of defects in the illuminated area.
Patent
Method and apparatus for determining surface profiles
TL;DR: In this article, a system for determining surface profiles of specimens such as semiconductor wafers includes a drive (46) for mounting the wafer (w) for oscillatory movement along a line and an optical imaging system (20, 26, 28) overlying the WF for focusing a beam on a small spot on the wF and including a photodetector (42) for detecting the reflected spot from the wFT.
Patent
Method and apparatus for measuring surface profiles
TL;DR: In this article, a system for determining surface profiles of specimens such as semiconductor wafers and for making linewidth measurements thereon includes a drive for mounting the wafer for oscillatory movement along a line and an optical imaging system overlying the Wafer for focusing a beam on a small spot on a wafer and including a photodetector for detecting the reflected spot from the Wafers.
Patent
Method of inspecting the pattern on a photographic mask
TL;DR: In this article, the pattern of the mask is printed on a photo-sensitive member prepared by forming an opaque or semitransparent photosensitive layer on a transparent substrate and an image of the printed pattern formed on the photosensitive member is inspected by the image processing technique.
Patent
Apparatus for detecting contaminants on the reticle of exposure system
TL;DR: In this article, an apparatus for detecting contaminants depositing on the reticle of a reduction projection mask aligner comprises a laser spot projector which conducts a laser beam to the light path upstream of the condenser lens of the aligner such that the laser beam is in the same direction as of the exposure light beam.