Patent
Method of and apparatus for controlling reactive impedances of a matching network connected between an rf source and an rf plasma processor
TLDR
In this article, a reactive impedance element to a plasma in a vacuum plasma processing chamber is connected via a matching network including first and second variable reactances that control loading of the source and tuning a load, including the reactive impedance elements and the plasma, to the source.Abstract:
An r.f. field is supplied by a reactive impedance element to a plasma in a vacuum plasma processing chamber. The element and source are connected via a matching network including first and second variable reactances that control loading of the source and tuning a load, including the reactive impedance element and the plasma, to the source. The values of the first and second variable reactances are changed to determine the amount the first variable reactance is to change for each unit change of the second variable reactance to attain the best match between the impedances seen looking into and out of output terminals of the r.f. source. Then the values of the first and second variable reactances are varied simultaneously based on the determination until the best impedance match between the impedances seen looking into and out of output terminals of the r.f. source is attained.read more
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Patent
Plasma Processing Apparatus
TL;DR: In this paper, a plasmas processing apparatus consisting of plural layers formed in stack one upon another on a semiconductor wafer placed on the sample holder located in the process chamber is etched with plasma generated by supplying high frequency power to the electrode disposed in a sample holder, and a power source for supplying power at different values to the ring-shaped electrode depending on the sorts of layers of the layer structure.
Patent
Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers
TL;DR: In this article, the end of a cleaning process of a vacuum workpiece processing chamber evacuated to a constant pressure vacuum condition is controlled by detecting a substantial decrease in the time rate of change of pressure in a foreline of evacuating the chamber after the plasma electrical impedance has been stabilized.
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Method for determining the concentration of an analyte in a liquid sample using small volume samples and fast test times
TL;DR: In this paper, the authors used sample volumes from about 0.3 μl to less than 1 μl and test times from about 3.5 to about 6 seconds after detection of the sample.
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Impedance matching device provided with reactance-impedance table
TL;DR: In this article, an impedance matching device is provided with an input detector for detecting RF voltage and current at the input terminal, and an output detector to detect RF voltage outputted from the output terminal.
References
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Patent
Automatic impedance matching apparatus and method
TL;DR: In this paper, an automatic impedance matching apparatus for matching an RF-signal generator to a load, such as a plasma etching chamber, is described, which consists of a matching network having two variable impedance devices, a tune detector for detecting the condition of the impedance match between the RF-Signal and the load, and a controller for modifying the values of the variable impedance components in response to the measured tune condition.
Patent
Electronically tuned matching network using predictor-corrector control system
TL;DR: In this article, an impedance matching network and a network model are used to estimate the load impedance from known present network values and a measurement of network input impedance, and to estimate optimum network values from the input impedance and the estimated load impedance.
Patent
Plasma emission source
TL;DR: An impedance matching network for continuously and automatically maximizing RF power transfer to a plasma emission torch includes a dual phase detector network and a variable impedance network as discussed by the authors, which is used to control the detector network.
Patent
Automatic impedance matching between source and load
TL;DR: An R.F. generator is used to provide power to a load via a transmission line wherein load impedance is automatically matched to the surge impedance of the transmission to provide maximum transfer of energy from the generator to the load.