Patent
Phase shift mask and its production
Isao Mita,勲 三田 +1 more
TLDR
In this paper, the shifter material of auxiliary patterns 2 of the phase shift mask including main pattern 1 and auxiliary pattern 2 is formed as a material having controlled light transmittance, by which the resolution of pattern forming regions is improved.Abstract:
PURPOSE:To provide a phase shift mask with which a wide production allowance is taken CONSTITUTION:The shifter material of auxiliary patterns 2 of the phase shift mask including main patterns 1 and the auxiliary patterns 2 is formed as a material having controlled light transmittance The light peak intensity in the sufficient main patterns and secondary light peak intensity of the regulated value or below are obtd by the auxiliary patterns 2 of a large width, by which the resolution of pattern forming regions is improved The large production allowance of the mask is taken by adopting the auxiliary patterns 2 of the large width The production stages for semi-light shielding films are omitted if this phase shift mask is applied to a halftone phase shift maskread more
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