Patent
Phase shift photomask and phase shift photomask dry etching method
TLDR
In this article, a phase shift photomask capable of being produced by dry etching with adequate in-plane uniformity of pattern dimension even if there is a large difference in exposed area ratio between different areas on the mask is presented.Abstract:
A phase shift photomask capable of being produced by dry etching with adequate in-plane uniformity of pattern dimension even if there is a large difference in exposed area ratio between different areas on the mask. In a phase shift photomask having an area provided with a phase shift layer which practically shifts the phase relative to another area, a dummy etching pattern (13) for dry etch rate correction is provided in an area other than a pattern exposure area (9 and 10), or a dummy etching pattern for dry etch rate correction having a size less than the limit of resolution attained by transfer is provided in the pattern exposure area, thereby reducing the etch rate nonuniformity due to the pattern density variation in the process of dry etching the phase shift photomask, and thus providing a phase shift photomask of high accuracy.read more
Citations
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Patent
Endpoint detection for photomask etching
TL;DR: In this article, a plasma etch chamber with a substrate support member has at least two optical components disposed therein for use in endpoint detection, which is achieved by the use of various optical measurement techniques for monitoring at different locations of the photomask.
Patent
Method of channel doping using diffusion from implanted polysilicon
H. Jim Fulford,Robert Dawson,Mark I. Gardner,Frederick N. Hause,Mark W. Michael,Bradley T. Moore,Derick J. Wristers +6 more
TL;DR: In this paper, a method of doping an integrated circuit device channel in a semiconductor substrate laterally enclosed by an isolation structure is described, which consists of forming a thin oxide layer overlying the IC channel and the isolation structure.
Patent
Phase-shift masks and methods of fabrication
TL;DR: In this article, the optical transmission and phase shifting functions of a phase shifting mask are achieved by controlling the optical properties and thickness of constituent film layers, which can be tuned for optimal performance at various wavelengths to an extent beyond that obtainable using a single layer film to control attenuation and phase shift of incident light.
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Apparatuses and methods for pre-erasing during manufacture of magnetic tape
TL;DR: In this paper, direct current (DC) pre-erasing is performed using a uni-polar direct current of a polarity opposite to the polarity of the direct current used to write the servo data.
Patent
Method of making a multi-channel time based servo tape media
TL;DR: In this paper, a thin film magnetic recording head is fabricated by forming a substrate from opposing ferrite blocks which have a ceramic member bonded between them, which is then diced to form a plurality of columns, wherein each column has a ferrite/ceramic combination.
References
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Patent
Patterned filled photo mask generation for integrated circuit manufacturing
TL;DR: In this paper, the planarity of the dielectric layer over a processing layer is increased by adjustments made to a mask generated for patterning the processing layer, where the fill pattern is placed in areas of the mask not filled by the active circuitry lines.
Patent
X-ray mask and method of manufacturing an X-ray mask
TL;DR: In this article, a method of manufacturing an X-ray mask comprising a substrate, an Xray transmission layer on the substrate, and an X ray absorption layer on a X ray transmission layer, is presented, which is flattened to remove undulation and to make roughness of the X-rays transmission layer smaller than 100 angstroms.