Patent
Photo method of making tri-level density photomask
TLDR
In this paper, a method of fabricating a photomask having at least three distinct zones of light transmissibility is disclosed, where a first mask is made from a predetermined pattern, and a second mask, made by contact printing of a diazo film, is formed from a selected portion of one zone of the original pattern.Abstract:
A method of fabricating a photomask having at least three distinct zones of light transmissibility is disclosed. A first mask is made from a predetermined pattern, this mask having only two distinct zones of light transmissibility. A second mask, made by contact printing of a diazo film, is formed from a selected portion of one zone of the original pattern, which zone has the greater light transmissibility. The second mask, being a contact print, is the photographic opposite of the first. The two masks are then aligned with the selected portion of the second mask superimposed over its original location in the first mask and a composite latent image thereof is formed in a suitable emulsion. This composite image is then developed and fixed on an appropriate support to form a photomask having at least three density zones.read more
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Patent
Method for producing color filter
TL;DR: In this paper, a method for producing a color filter involves (a) forming a photo-sensitive coating film on at least a transparent electrically conductive layer of a first substrate having both the transparent electrodes and a light-intercepting layer on its surface or (b) a second substrate having the transparent electrode on its outermost surface and a LIDAR between the second substrate and the transparent electric conducting layer and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances.
Patent
Multi mask method for selective mask feature enhancement
TL;DR: The preferred embodiment of the present invention is a method of enhancing normally unenhanced features types as mentioned in this paper, where pattern shapes are placed on two or more relatively simple, modified masks instead of using a single mask containing diverse feature types.
Patent
Read-only optical data card
Jerome Drexler,Eric W. Bouldin +1 more
TL;DR: In this article, a double-sided data card with a transparent card base and two film substrate layers, two reflective layers and two optical storage layers is also disclosed, where the photosensitive layers may be silver-halide, diazo or vesicular film emulsions.
Patent
Gray scale etching for thin flexible interposer
Ernest Bassous,Gobinda Das,Frank D. Egitto,Natalie B. Feilchenfeld,Elizabeth Foster,Stephen Joseph Fuerniss,James Steven Kamperman,Donald Joseph Mikalsen,Michael R. Scheuermann,David B. Stone +9 more
TL;DR: In this article, a sculpted probe pad and a gray scale etching process for making arrays of such probe pads on a thin flexible interposer for testing the electrical integrity of microelectronic devices at terminal metallurgy are described.
Patent
Thermosensitive recording material having recording layer containing fluorescent dye
TL;DR: In this paper, a thermosensitive recording material having a fluorescent color comprising a support, a thermensitive recording layer formed on one side of the support, and optionally an adhesive layer is presented.
References
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Transparent photographic masks
TL;DR: In this paper, a photo-residual mask is made by exposure to light in accordance with an original (especially by contact exposure under a primary mask) containing the pattern to be reproduced, of light sensitive material having a flat, rigid, dimensionally stable transparent base such as glass and a thin (e.g. 0.5 to 10 micron) transparent resin layer adhering to the base and containing, molecularly dispersed therein an azo coupling component and a light-sensitive diazonium compound.
Patent
Photomechanical method of producing grounded printed circuits
TL;DR: In this paper, a photomechanical method of producing a grounded printed circuit utilizing an ungrounded circuit negative, a base film and a transparent sheet sandwiched therebetween is presented.
Patent
Mask overlay checking means
TL;DR: In this paper, a method for comparing the performance of a PAIR of light masks is presented, where one of the MASKS has smaller regions and the other has larger regions.