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Open AccessJournal Article

Physical vapor deposition of thin films

P. C. Johnson
- 01 Jan 1989 - 
- Vol. 76, Iss: 6, pp 30-33
TLDR
In this paper, the authors compare avantages et des inconvenients des trois types of depot in phase vapeur (evaporation, pulverisation, depot ionique).
Abstract
Principes de base des procedes de depot physique en phase vapeur (evaporation, pulverisation, depot ionique). Comparaison des avantages et des inconvenients des trois types de depot. Applications actuelles de chacun d'eux et perspectives d'applications futures et de developpement

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