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Journal ArticleDOI

Radiative recombination at deep impurity centres in AlN:O

TLDR
In this paper, the ionization energy of the deep donor states due to oxygen and of the acceptor levels due to compensating VA1 vacancies were determined from the optical properties of AlN:O.
Abstract
The ionization energy of the deep donor states due to oxygen and of the acceptor levels due to compensating VA1 vacancies were determined from the optical properties of AlN:O. The theoretical calculations together with the experimental data (the emission spectra, the excitation of luminescence spectra and EPR data) indicate that the deepest donor level belongs to the ion O−.

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Citations
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Progress and prospects of group-III nitride semiconductors

TL;DR: In this paper, the authors review recent progress in the group-III nitride and related materials, and electronic and optical devices based on them, focusing on the current status of wide bandgap gallium nitride, and related semiconductors from both the materials and devices points of view.
Journal ArticleDOI

On the nature of the oxygen-related defect in aluminum nitride

TL;DR: In this article, the oxygen-related defect in an aluminum nitride (AIN) single crystal and in polycrystalline ceramics was investigated utilizing photoluminescence spectroscopy, thermal conductivity measurements, x-ray diffraction lattice parameter measurements, and transmission electron microscopy.
Journal ArticleDOI

Optical characterization of aln films grown by plasma source molecular beam epitaxy

TL;DR: In this paper, thin films of AlN were grown on Si(111), sapphire (1102), and sappire (0001) substrates by plasma source molecular beam epitaxy (PSMBE), and the optical phonon modes of thin AlN/Si films were directly observed in infrared transmission and 80° angle of incidence reflectance spectra.
Journal ArticleDOI

Thermoluminescence kinetics of oxygen-related centers in AlN single crystals

TL;DR: In this article, the authors studied the thermoluminescence (TL) in bulk aluminum nitride single crystals irradiated by UV and found that TL is most effectively excited by the 5.04 eV photons.
References
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Journal ArticleDOI

Epitaxially grown AlN and its optical band gap

TL;DR: In this article, singlecrystal layers of AlN have been grown on sapphire substrates between 1000 and 1100 °C by vapor phase reaction of aluminum chlorides with ammonia, and the purity, color, crystallinity, growth morphology, and electrical resistivity of the epitaxial layers have been investigated.
Journal ArticleDOI

Ain single crystals

TL;DR: In this article, single crystals of aluminum nitride up to 1 cm long and 0.3 in diameter have been grown by a sublimation-recondensation technique at about 2250°C.
Journal ArticleDOI

The electronic band structures of the wide band gap semiconductors GaN and A1N

TL;DR: In this paper, a non-local model potential was developed for nitrogen and used to calculate the energy band structures of GaN and A1N and the resulting band structures were found to be in good agreement with optical data for these materials.
Journal ArticleDOI

Ultraviolet electroluminescence in AlN

R. F. Rutz
TL;DR: In this article, a method of growing single-crystal low resistivity (∼103 Ω cm) n-type AlN is described in which dc ultraviolet electroluminescence is observed for the first time.
Journal ArticleDOI

The luminescence properties of AlN with manganese and rare earth activators under ultraviolet and cathode-ray excitation

TL;DR: In this paper, the emission spectra of self-, Mn-, Eu- and Sm-activated AlN luminophores under ultraviolet and cathode ray excitation as well as the excitation spectra for Mn and self-activated phosphors are measured.
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