Journal ArticleDOI
Reducing the Proximity Effect in Electron Lithography
M.R. Soqard
- Vol. 38, pp 310-311
About:
The article was published on 1980-08-01. It has received 0 citations till now. The article focuses on the topics: Proximity effect (electron beam lithography).read more
References
More filters
Journal ArticleDOI
Energy dissipation in a thin polymer film by electron beam scattering
TL;DR: In this article, Monte Carlo calculations have been performed to determine the spatial distribution of energy dissipated in a 4000-A-thick film of polymethyl methacrylate (PMMA), due to an incident electron beam.
Journal ArticleDOI
Direct observation of backscatter electron distributions on surfaces
R. D. Heidenreich,L. F. Thompson +1 more
TL;DR: In this article, the use of vinyl ferrocene monomer as a contaminating agent for the direct SEM observation of backscatter electron flux from target surfaces is described, and the method readily yields a back scatter spatial current distribution as a function of radial distance r from the incident probe beam of the form JB(r) = exp(br).