Superhydrophobic Surfaces Prepared by Microstructuring of Silicon Using a Femtosecond Laser

TLDR: The method consists of irradiating silicon wafers with femtosecond laser pulses and then coating the surfaces with a layer of fluoroalkylsilane molecules, which creates a surface morphology that exhibits structure on the micro- and nanoscale.

Abstract: We present a simple method for fabricating superhydrophobic silicon surfaces. The method consists of irradiating silicon wafers with femtosecond laser pulses and then coating the surfaces with a layer of fluoroalkylsilane molecules. The laser irradiation creates a surface morphology that exhibits structure on the micro- and nanoscale. By varying the laser fluence, we can tune the surface morphology and the wetting properties. We measured the static and dynamic contact angles for water and hexadecane on these surfaces. For water, the microstructured silicon surfaces yield contact angles higher than 160° and negligible hysteresis. For hexadecane, the microstructuring leads to a transition from nonwetting to wetting.