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Patent

Thin film field effect transistor and method of making same

TLDR
In this article, a film field effect transistor is proposed to operate at fast switching rates for use in video display applications, where the transistor includes a body of silicon semiconductor material having a structure more ordered than amorphous material and less ordered than single crystalline material.
Abstract
There is disclosed a film field effect transistor which can be operated at fast switching rates for use, for example, in video display applications. The transistor includes a body of silicon semiconductor material having a structure more ordered than amorphous material and less ordered than single crystalline material. The source and drain of the transistor comprise rectifying contacts formed on the body of silicon semiconductor material. Also disclosed are a method of making the transistor and an electronically addressable array system utilizing the transistor to advantage.

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Patent

Semiconductor device and method for forming the same

TL;DR: In this article, an active layer comprising a silicon semiconductor is formed on a substrate having an insulating surface Hydrogen is introduced into The active layer, a thin film comprising SiO x N y is formed to cover the active layer and then a gate insulating film comprising silicon oxide film formed on the thin film.
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Electro-optical device

TL;DR: In this article, an electro-optical device having a plurality of pixels, including a majority of EL elements, provides a gray-scale display by controlling a period of time at which the plurality of the EL elements emit light in one frame period, and a polarity of an EL driving voltage, which is a difference between the potentials applied to the first and second electrodes, is inverted for each one-frame period.
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Semiconductor display device

TL;DR: In this article, the luminance of the EL elements of each in the display pixels is controlled in accordance with the amount of electric current flowing in each of the diodes, which is a function of the environment.
Patent

Integrated circuit device and fabrication using metal-doped chalcogenide materials

Jiutao Li, +1 more
TL;DR: In this article, metal-doped chalcogenide layers are formed by using a plasma to induce diffusion of metal into a chalkogenide layer concurrently with metal deposition, which reduces contamination concerns and physical damage resulting from moving the device substrate from tool to tool.
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Electro-optical device and method of driving the same

TL;DR: An active matrix display device for suppressing voltage variation ΔV due to off-operation of a gate pulse, including TFTs and picture-element electrodes, was proposed in this paper. But it was not shown in practice.
References
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Patent

Integrated circuit compatible thin film field effect transistor and method of making same

TL;DR: In this article, integrated circuit compatible thin film field effect transistors which can be fabricated at low temperatures and operated at fast switching rates for use, for example, in video rate applications are disclosed.
Patent

Liquid crystal display with vertical non-single crystal semiconductor field effect transistors

TL;DR: In this paper, the first, second and third semiconductor layers are formed of a non-single crystal semiconductor doped with a dangling bond neutralizer, and the second semiconductor layer has a higher resistivity than the first and third.
Patent

Method to improve the reverse leakage characteristics in metal semiconductor contacts

TL;DR: In this paper, a method for improving the reverse leakage characteristics in metal semiconductor contact devices is disclosed, and the process embodies ionic plasma bombardment as a step in producing improved reverse bias current voltage characteristics.
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