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Patent

Water-barrier performance of an encapsulating film

TLDR
In this article, a method and apparatus for depositing a material layer onto a substrate is described, which can be used as an encapsulating layer for various display applications which require low temperature deposition process due to thermal instability of underlying materials used.
Abstract
A method and apparatus for depositing a material layer onto a substrate is described. The method includes delivering a mixture of precursors for the material layer into a process chamber and depositing the material layer on the substrate at low temperature. The material layer can be used as an encapsulating layer for various display applications which require low temperature deposition process due to thermal instability of underlying materials used. In one aspect, the encapsulating layer includes one or more material layers (multilayer) having one or more barrier layer materials and one or more low-dielectric constant materials. The encapsulating layer thus deposited provides reduced surface roughness, improved water-barrier performance, reduce thermal stress, good step coverage, and can be applied to many substrate types and many substrate sizes. Accordingly, the encapsulating layer thus deposited provides good device lifetime for various display devices, such as OLED devices. In another aspect, a method of depositing an amorphous carbon material on a substrate at low temperature is provided. The amorphous carbon material can be used to reduce thermal stress and prevent the deposited thin film from peeling off the substrate.

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Citations
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References
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Patent

Light-emitting device

TL;DR: In this paper, a light-emitting device with the use of an amorphous oxide was presented, which has a lightemitting layer existing between first and second electrodes and a field effect transistor, of which the active layer is an Amorphous.
Patent

Low pressure vapor phase deposition of organic thin films

TL;DR: In this paper, the authors present a method for preparing organic thin films on substrates, the method comprising the steps of providing a plurality of organic precursors in the vapor phase, and reacting the plurality or organic pre-agents at a sub-atmospheric pressure.
Patent

Hydrogen assisted undoped silicon oxide deposition process for HDP-CVD

TL;DR: In this paper, a method of forming a silicon oxide layer over a substrate disposed in a high density plasma substrate processing chamber was proposed, where the hydrogen-containing source was selected from the group of H2, H2O, NH3, CH4 and C2H6.
Proceedings ArticleDOI

Gas permeation and lifetime tests on polymer-based barrier coatings

TL;DR: BarixTM as discussed by the authors is a flexible, transparent plastic substrate for OLED display applications, which is composed of a flexible composite thin film barrier and transparent conductive oxide (CO) oxide.
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