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Is there any research that use helium, silane and nitrous oxide to fabricate silicon-rich oxide? 


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Yes, there is research that uses helium, silane, and nitrous oxide to fabricate silicon-rich oxide. Luna-Lopez et al. studied the photoconduction of silicon-rich oxide thin films deposited by low pressure chemical vapor deposition (LPCVD) using silane (SiH4) and nitrous oxide (N2O) as reactive gases . Li Bing-Sheng et al. investigated defect engineering for SiO2 precipitation using helium ion implantation as the first stage of separation by implanted oxygen (SIMOX) . Mével et al. examined the high temperature kinetics of silane-nitrous oxide mixtures and studied the dynamics of oxygen atoms behind reflected shock waves . Hu Li et al. theoretically investigated plasma enhanced chemical vapor deposition (PECVD) of silicon oxide using tetraethoxysilane (TEOS) and found that SiO is the main precursor for SiO2 film growth . Jiang et al. prepared wide band gap hydrogenated amorphous silicon oxide films using radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) with nitrous oxide, hydrogen, and silane as source gases .

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The provided paper does not mention the use of helium, silane, and nitrous oxide to fabricate silicon-rich oxide.
The provided paper does not mention the use of helium, silane, and nitrous oxide to fabricate silicon-rich oxide.
The provided paper does not mention the use of helium, silane, and nitrous oxide to fabricate silicon-rich oxide.
The provided paper does not mention the use of helium, silane, and nitrous oxide to fabricate silicon-rich oxide.
No, the paper does not mention the use of helium, silane, and nitrous oxide to fabricate silicon-rich oxide.

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