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Adam T. Neal

Researcher at Air Force Research Laboratory

Publications -  67
Citations -  16136

Adam T. Neal is an academic researcher from Air Force Research Laboratory. The author has contributed to research in topics: Electron mobility & Field-effect transistor. The author has an hindex of 30, co-authored 60 publications receiving 14429 citations. Previous affiliations of Adam T. Neal include Purdue University & Universal Technical Institute.

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Phosphorene: An Unexplored 2D Semiconductor with a High Hole Mobility

TL;DR: In this paper, the 2D counterpart of layered black phosphorus, which is called phosphorene, is introduced as an unexplored p-type semiconducting material and the authors find that the band gap is direct, depends on the number of layers and the in-layer strain, and significantly larger than the bulk value of 0.31-0.36 eV.
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Phosphorene: A New 2D Material with High Carrier Mobility

TL;DR: In this article, a few-layer phosphorene has been introduced as a 2D p-type material for electronic applications, which has an inherent, direct and appreciable band gap that depends on the number of layers.

Phosphorene: An Unexplored 2D Semiconductor with a High Hole

TL;DR: The found phosphorene to be stable and to have an inherent, direct, and appreciable band gap, which depends on the number of layers and the in-layer strain, and is significantly larger than the bulk value of 0.31-0.36 eV.
Journal ArticleDOI

Channel Length Scaling of MoS2 MOSFETs

TL;DR: The performance limit of short channel MoS(2) transistors is dominated by the large contact resistance from the Schottky barrier between Ni and MoS (2) interface, where a fully transparent contact is needed to achieve a high-performance short channel device.