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Andreas Tünnermann

Researcher at Fraunhofer Society

Publications -  1757
Citations -  48543

Andreas Tünnermann is an academic researcher from Fraunhofer Society. The author has contributed to research in topics: Fiber laser & Laser. The author has an hindex of 97, co-authored 1738 publications receiving 43757 citations. Previous affiliations of Andreas Tünnermann include Schiller International University & University of Jena.

Papers
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Journal ArticleDOI

Multipole nonlinearity of metamaterials

Jörg Petschulat, +6 more
- 10 Dec 2009 - 
TL;DR: In this paper, the authors report on the linear and nonlinear optical response of metamaterials evoked by rst and second order multipoles, and derive the equations that describe light propagation where special emphasis is put on second harmonic generation.
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Hole Formation Process in Ultrashort Pulse Laser Percussion Drilling

Sven Döring, +7 more
- 01 Jan 2013 - 
TL;DR: In this article, the authors performed an in-situ analysis of the percussion drilling process with ultrashort laser pulses in silicon, which acts as a model system for drilling opaque materials like metals.
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Quasi-three-level room-temperature Nd:YAG ring laser with high single-frequency output power at 946 nm.

Ingo Freitag, +3 more
- 15 Dec 1995 - 
TL;DR: Efficient room-temperature operation of a diode-pumped Nd:YAG laser is demonstrated for the quasi-three-level transition at 946 nm and high amplitude and frequency stability of the emitted radiation is observed.
Journal ArticleDOI

Nonlinear discrete optics in femtosecond laser-written photonic lattices

Matthias Heinrich, +5 more
- 30 Jul 2011 - 
TL;DR: In this paper, the reflection of transversely propagating light at kinks in planar photonic lattices with detuned pivotal site was studied and the results showed that planar planar lattices are the tool of choice for the experimental investigation of light propagation in discrete optical systems with Kerr nonlinearity.
Proceedings ArticleDOI

Optical modeling of needle like silicon surfaces produced by an ICP-RIE process

Matthias Kroll, +8 more
- 18 May 2010 - 
TL;DR: In this paper, the authors present results of rigorous optical modeling of reactive ion etched crystalline silicon surfaces, so called Black Silicon, for different etching parameters and compare them to experimental data.