A
Atsushi Yamada
Researcher at Nikon
Publications - 10
Citations - 34
Atsushi Yamada is an academic researcher from Nikon. The author has contributed to research in topics: Reticle & Stepper. The author has an hindex of 4, co-authored 9 publications receiving 30 citations.
Papers
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Journal ArticleDOI
Full-field exposure performance of electron projection lithography tool
Kazuaki Suzuki,Noriyuki Hirayanagi,Tomoharu Fujiwara,Atsushi Yamada,Junji Ikeda,Takehisa Yahiro,Shinichi Kojima,Jin Udagawa,Hajime Yamamoto,Norihiro Katakura,Suzuki Motoko,Aoyama Takashi,Hidekazu Takekoshi,Takaaki Umemoto,Hiroyasu Shimizu,Saori Fukui,Shohei Suzuki,Teruaki Okino,Yukiharu Ohkubo,Toshimasa Shimoda,Toru Tanida,Yoichi Watanabe,Yoshiaki Kohama,Kaoru Ohmori,Futoshi Mori,Shigeru Takemoto,Takeshi Yoshioka,Hiroshi Hirose,Kenji Morita,Kazunari Hada,Shintaro Kawata,Yukio Kakizaki,Takaharu Miura +32 more
TL;DR: Nikon developed an EPL exposure tool as an electron-beam (EB) stepper and the first generation EB stepper was now almost completed as an R&D tool for the 65nm technology node.
Journal ArticleDOI
EPL electron optics performance on test stand: 1. resolution results
Muneki Hamashima,Shinichi Kojima,Takaaki Umemoto,Hiroyasu Shimizu,Junji Ikeda,Atsushi Yamada,Shin-ichi Takahashi,Takehisa Yahiro,Sumito Shimizu,K. Okamoto,Takeshi Yamaguchi,S. Miura,Shintaro Kawata,Kazuaki Suzuki +13 more
TL;DR: In this paper, the performance of the electron optical column of the EB-stepper mounted on its test stand is reported, mainly focusing on the subject of resolution as preliminary results, with SEM photos of line/space patterns and contact hole features, printed in both positive and negative resists.
Patent
Charged particle beam exposure apparatus and semiconductor device manufacturing method
Atsushi Yamada,Koichi Kamijo +1 more
TL;DR: In this paper, the semi-angles and ratio of ampere-turn values of the deflecting coils of at least one of the components constituting the deflector are set in such a way that a 3θ component, 5 θ component and 7 θ components of a magnetic field generated by the deflectors are substantially zero.
Patent
Charged-particle-beam projection-lens system exhibiting reduced blur and geometric distortion, and microlithography apparatus including same
TL;DR: In this paper, the Coulomb effect is reduced but geometric aberration increases, which degrades overall optical characteristics, and the column length of the projection-lens system is increased.
Journal ArticleDOI
First dynamic exposure results from an electron projection lithography tool
Kazuaki Suzuki,Tomoharu Fujiwara,Shinichi Kojima,Noriyuki Hirayanagi,Takehisa Yahiro,Jin Udagawa,Sumito Shimizu,Hajime Yamamoto,Suzuki Motoko,Hidekazu Takekoshi,Saori Fukui,Muneki Hamashima,Junji Ikeda,Teruaki Okino,Hiroyasu Shimizu,Shin-ichi Takahashi,Atsushi Yamada,Takaaki Umemoto,Satoshi Katagiri,Yukiharu Ohkubo,Toshimasa Shimoda,Keiichi Hirose,Toru Tanida,Yoichi Watanabe,Kaminaga Takeshi,Yoshiaki Kohama,Futoshi Mori,Shigeru Takemoto,Takeshi Yoshioka,Hiroshi Hirose,Kenji Morita,Kazunari Hada,Shintaro Kawata,Tatsuo Sato,Yu Sato,Masateru Tokunaga,Kazuya Okamoto,Yukio Kakizaki,Takaharu Miura +38 more
TL;DR: In this paper, the first dynamic exposure in the history of EPL was reported, although only a φ100 mm reticle was used and 10 mm×10 mm exposure fields were exposed.