Nanosphere lithography (NSL) is an inexpensive, simple to implement, inherently parallel, high throughput, materials general nanofabrication technique capable of producing an unexpectedly large variety of nanoparticle structures and well-ordered 2D nanoparticle arrays. This article describes our recent efforts to broaden the scope of NSL to include strategies for the fabrication of several new nanoparticle structural motifs and their characterization by atomic force microscopy. NSL has also been demonstrated to be well-suited to the synthesis of size-tunable noble metal nanoparticles in the 20−1000 nm range. This characteristic of NSL has been especially valuable for investigating the fascinating richness of behavior manifested in size-dependent nanoparticle optics. The use of localized surface plasmon resonance (LSPR) spectroscopy to probe the size-tunable optical properties of Ag nanoparticles and their sensitivity to the local, external dielectric environment (viz., the nanoenvironment) is discussed in...

Nanosphere Lithography: A Versatile Nanofabrication Tool for Studies of Size-Dependent Nanoparticle Optics

Solar cells based on organometallic halide perovskite absorber layers are emerging as a high-performance photovoltaic technology. Using highly sensitive photothermal deflection and photocurrent spectroscopy, we measure the absorption spectrum of CH3NH3PbI3 perovskite thin films at room temperature. We find a high absorption coefficient with particularly sharp onset. Below the bandgap, the absorption is exponential over more than four decades with an Urbach energy as small as 15 meV, which suggests a well-ordered microstructure. No deep states are found down to the detection limit of ∼1 cm–1. These results confirm the excellent electronic properties of perovskite thin films, enabling the very high open-circuit voltages reported for perovskite solar cells. Following intentional moisture ingress, we find that the absorption at photon energies below 2.4 eV is strongly reduced, pointing to a compositional change of the material.

Organometallic Halide Perovskites: Sharp Optical Absorption Edge and Its Relation to Photovoltaic Performance

Enhancement mode, field effect transistors wherein at least a portion of the transistor structure may be substantially transparent. One variant of the transistor includes a channel layer comprising a substantially insulating, substantially transparent, material selected from ZnO, Sn02, or In203. A gate insulator layer comprising a substantially transparent material is located adjacent to the channel layer so as to define a channel layer/gate insulator layer interface. A second variant of the transistor includes a channel layer comprising a substantially transparent material selected from substantially insulating ZnO, Sn02or In2O3, the substantially insulating ZnO, Sn02, or In203 being produced by annealing. Devices that include the transistors and methods for making the transistors are also disclosed.

Transistor structures and methods for making the same

A highly ordered gold nanodot array was fabricated by vacuum evaporation using an anodic porous alumina membrane with through-holes of nanometer scale as a mask. This technique resulted in an orderly arrangement of Au dots with a diameter of approximately 40 nm over a large area on a Si substrate.

https://iopscience.iop.org/article/10.1143/JJAP.35.L126/pdf

Fabrication of gold nanodot array using anodic porous alumina as an evaporation mask

The present invention provides for sequential chemical vapor deposition by employing a reactor operated at low pressure, a pump to remove excess reactants, and a line to introduce gas into the reactor through a valve. A first reactant forms a monolayer on the part to be coated, while the second reactant passes through a radical generator which partially decomposes or activates the second reactant into a gaseous radical before it impinges on the monolayer. This second reactant does not necessarily form a monolayer but is available to react with the monolayer. A pump removes the excess second reactant and reaction products completing the process cycle. The process cycle can be repeated to grow the desired thickness of film.

Sequential chemical vapor deposition

The effect of thermal and structural disorder on the electronic structure of hydrogenated amorphous silicon is investigated by measurement of the shape of the optical absorption edge as a function of temperature and thermal evolution of hydrogen. The data are consistent with the idea that the thermal and structural disorder are additive, and suggest that the disorder, rather than the hydrogen content, is the fundamental determining factor in the optical band gap.

Disorder and the Optical-Absorption Edge of Hydrogenated Amorphous Silicon

The width of the conduction- and valence-band tails in amorphous silicon hydride are inferred from time-of-flight measurements of the temperature dependence of the electron and hole drift mobilities, and a multiple-trapping model of dispersive transport.

Evidence for Exponential Band Tails in Amorphous Silicon Hydride

Superreseaux semiconducteurs consistant en une alternance de couches de 8 a 1200 A de semiconducteurs tels que a-Si:H, a-Ge:H, a-SiN x :H et a-Si 1−x C x :H. Des mesures de diffraction RX, de photoconductivite, et de photoluminescence indiquent que les couches sont lisses a l'echelle atomique et que les interfaces sont sans defauts. Interpretation des variations de l'absorption optique et de la photoluminescence avec l'epaisseur des couches des superreseaux a-Si:H/a-SiN x :H en termes d'effets de taille quantiques

B. Abeles

Papers

Disorder and the Optical-Absorption Edge of Hydrogenated Amorphous Silicon

Evidence for Exponential Band Tails in Amorphous Silicon Hydride

Amorphous Semiconductor Superlattices

Optical characterization of amorphous silicon hydride films

Optical absorption above the optical gap of amorphous silicon hydride