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David Hash

Researcher at Ames Research Center

Publications -  24
Citations -  1876

David Hash is an academic researcher from Ames Research Center. The author has contributed to research in topics: Carbon nanotube & Plasma. The author has an hindex of 14, co-authored 23 publications receiving 1782 citations.

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Carbon nanotube growth by PECVD: a review

TL;DR: In this article, a review of the low temperature plasma research community that has successfully addressed such issues, through plasma and surface diagnostics and modelling, in semiconductor processing and diamond thin film growth is presented.
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Growth of multiwall carbon nanotubes in an inductively coupled plasma reactor

TL;DR: In this article, a high density plasma from a methane-hydrogen mixture is generated in an inductively coupled plasma reactor, and multiwalled carbon nanotubes (MWNTs) are grown on silicon substrates with multilayered Al/Fe catalysts.
Journal ArticleDOI

The Significance of Plasma Heating in Carbon Nanotube and Nanofiber Growth

TL;DR: In this article, the effect of the plasma on heating the growth substrate in plasma enhanced chemical vapor deposition (PECVD) of carbon nanotubes is characterized for the first time, and significant temperatures, as high as 700 °C, are induced from a C2H2:NH3 direct current (dc) plasma with no other heat source present.