D
Dong Guo
Researcher at Beihang University
Publications - 94
Citations - 2409
Dong Guo is an academic researcher from Beihang University. The author has contributed to research in topics: Ceramic & Ferroelectricity. The author has an hindex of 26, co-authored 92 publications receiving 2047 citations. Previous affiliations of Dong Guo include National Institute for Materials Science & University of Tokyo.
Papers
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Synaptic plasticity and learning behaviours mimicked through Ag interface movement in an Ag/conducting polymer/Ta memristive system
Sizhao Li,Fei Zeng,Chao Chen,Hongyan Liu,Guangsheng Tang,Shuang Gao,Cheng Song,Yisong Lin,Feng Pan,Dong Guo +9 more
TL;DR: In this article, a memristor with the simple structure Ag/poly(3,4-ethylenedioxythiophene):poly (styrenesulphonate) (PEDOT:PSS)/Ta was fabricated.
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The giant electrocaloric effect and high effective cooling power near room temperature for BaTiO₃ thick film
TL;DR: In this paper, the electrocaloric effect of BaTiO3 multilayer thick film was investigated by direct calorimetric measurement, and it was shown that the ECE increases monotonically with the enhancement of applied field.
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Phase structure and nano-domain in high performance of BaTiO3 piezoelectric ceramics
TL;DR: In this article, the effects of sintering temperature on the crystalline structure and piezoelectric properties of BaTiO 3 ceramics have been investigated using XRD patterns.
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A systematic modification of the large electrocaloric effect within a broad temperature range in rare-earth doped BaTiO3 ceramics
TL;DR: In this paper, a systematic exploration of modifying the electrocaloric effect (ECE) in BaTiO3 ceramics by rare-earth substitution (Ba0.94R0.04TiO 3, R = La, Ce, Nd, Sm, Eu, Gd, Dy, Er) is presented, which shows a high resistivity of ∼1011 Ω cm except for Er doped samples due to the amphoteric incorporation of Er.
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Effect of annealing on the mobility and morphology of thermally activated pentacene thin film transistors
TL;DR: In this paper, the effect of thermal annealing on the morphology and carrier mobility of the transistors was investigated and it was shown that only with a temperature below a critical temperature of approximately 45°C could improve the mobility.