Evan L. Schwartz

TL;DR: In situ studies indicate that self-assembly occurs spontaneously upon attaining the threshold swelling ratios, and shows that for self assembly to occur, the polymer thin film must surpass a swollen thickness ratio of 212% of its original thickness when swollen in THF vapors and a ratio of 268% for acetone vapor annealing.

TL;DR: Poly(alpha-methylstyrene)-block-poly(4-hydroxystyrene) acts as both a lithographic deep UV photoresist and a self-assembling material, making it ideal for patterning simultaneously by both top-down and bottom-up fabrication methods.

TL;DR: In this article, an electronically switchable privacy film was proposed for display devices, which consists of a pair of mutually opposing transparent electrodes, an optically transparent microstructured layer disposed between the transparent electrodes and a plurality of micro-structured ribs extending across a surface thereof.

TL;DR: In this article, the authors used HfO2 nanoparticles stabilized with selected ligands to obtain high refractive index and low absorbance under 193 nm radiation, and combined with an appropriate photopolymer were used as a nanocomposite photoresist.

TL;DR: In this article, a transparent, high refractive index inorganic photoresist with significantly higher etch resistance was developed, which was shown superior resolution with both E-beam and 193 nm lithography, producing sub-50 nm patterns.