E
Evelyn L. Hu
Researcher at University of California, Santa Barbara
Publications - 290
Citations - 10338
Evelyn L. Hu is an academic researcher from University of California, Santa Barbara. The author has contributed to research in topics: Quantum well & Etching (microfabrication). The author has an hindex of 46, co-authored 286 publications receiving 10021 citations. Previous affiliations of Evelyn L. Hu include California NanoSystems Institute.
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Validation of Lasing in Active Nanocavities
Yongseok Choi,Matthew T. Rakher,K. Hennessy,Stefan Strauf,Antonio Badolato,Pierre Petroff,Dirk Bouwmeester,Evelyn L. Hu +7 more
TL;DR: In this paper, an unambiguous proof of lasing in an active nanocavity with ultrahigh spontaneous emission coupling factor (beta = 0.65) is presented, where the transition from thermal to coherent light photon statistics is observed in the beta << 1 lasing regime.
Journal ArticleDOI
Low-temperature (4.2–9K) transport along InAs-AlSb quantum wells with δ-doped barriers and superconducting niobium electrodes
TL;DR: In this paper, an improved nucleation procedure involving the GaAs→AlAs-AlSb sequence, the use of a thick GaSb buffer, and modulation δ-doping of the quantum well with Te was reported.
Journal ArticleDOI
Optical properties of GaN Photonic Crystal Membrane Nanocavities at Blue Wavelengths
Yong-Seok Choi,Cedrik Meier,Rajat Sharma,K. Hennessy,Elaine D. Haberer,Shuji Nakamura,Evelyn L. Hu +6 more
TL;DR: In this paper, the design parameters for high-Q photonic-crystal (PC) bandgap modes in the emission wavelengths of InGaN/GaN multiple quantum wells were investigated.
Proceedings ArticleDOI
Optical properties of GaN Photonic Crystal Membrane Nanocavities
Yong-Seok Choi,Cedrik Meier,Rajat Sharma,K. Hennessy,Elaine D. Haberer,Y. Gao,Shuji Nakamura,Evelyn L. Hu +7 more
TL;DR: L7 photonic-crystal membrane nanocavities with Q factors of 600 have been realized based on the GaN/InGaN material system in this paper, where the authors showed that a L7 nmocavity with high Q factors as high as 5×104 can be achieved.
Proceedings ArticleDOI
Conductance transient characterization of reactive ion etched HEMT gate recesses
TL;DR: In this article, a simple technique was devised to examine the effects of RIE self-bias voltage, plasma exposure time, and oxygen plasma clean conditions on the AlInAs Schottky contact layer of an InP-based HEMT.