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Felix Holzner
Researcher at IBM
Publications - 33
Citations - 618
Felix Holzner is an academic researcher from IBM. The author has contributed to research in topics: Thermal scanning probe lithography & Lithography. The author has an hindex of 10, co-authored 32 publications receiving 582 citations. Previous affiliations of Felix Holzner include University of Tübingen & ETH Zurich.
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Journal ArticleDOI
Combined uptake of [18F]FDG and [18F]FMISO correlates with radiation therapy outcome in head-and-neck cancer patients.
TL;DR: FMISO and FDG PET data provide independent information about the examined tumour and a quantification of the correlated tracer uptake seems to be meaningful.
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"Artificial micro organs"--a microfluidic device for dielectrophoretic assembly of liver sinusoids.
Julia Schütte,Britta Hagmeyer,Felix Holzner,Massimo Kubon,Simon Werner,Christian Freudigmann,Karin Benz,J Böttger,Rolf Gebhardt,Holger Becker,Martin Stelzle +10 more
TL;DR: A new microfluidic test system for liver toxicity is developed based on an organ-like liver 3D co-culture of hepatocytes and endothelial cells, featuring cell culture chambers with integrated electrodes for the assembly of liver sinusoids by dielectrophoresis.
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Directed placement of gold nanorods using a removable template for guided assembly.
Felix Holzner,Cyrill Kuemin,Cyrill Kuemin,Philip Paul,James L. Hedrick,Heiko Wolf,Nicholas D. Spencer,Urs T. Duerig,Armin W. Knoll +8 more
TL;DR: A temperature sensitive polymer film is used as a removable template to position, and align, gold nanorods onto an underlying target substrate with an overall positioning accuracy of ≈10 nm onto an unstructured target substrate.
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Rapid turnaround scanning probe nanolithography.
TL;DR: A complete lithography and metrology system based on thermomechanical writing into organic resists capable of implementing rapid turnaround and carried out using a thermoelectric topography sensing method is presented.
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Thermal Probe Maskless Lithography for 27.5 nm Half-Pitch Si Technology
Lin Lee Cheong,Philip Paul,Felix Holzner,Michel Despont,Daniel J. Coady,James L. Hedrick,Robert D. Allen,Armin W. Knoll,Urs T. Duerig +8 more
TL;DR: The demonstrated process capabilities in terms of feature density and line-edge roughness are in accordance with today's requirements for maskless lithography, for example for the fabrication of extreme ultraviolet (EUV) masks.