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Heiko Wolf

Researcher at IBM

Publications -  101
Citations -  6258

Heiko Wolf is an academic researcher from IBM. The author has contributed to research in topics: Substrate (printing) & Microcontact printing. The author has an hindex of 37, co-authored 100 publications receiving 5919 citations. Previous affiliations of Heiko Wolf include University of Bern & University of Jena.

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Printing meets lithography: soft approaches to high-resolution patterning

TL;DR: A high-resolution printing technique based on transferring a pattern from an elastomeric stamp to a solid substrate by conformal contact is developed, an attempt to enhance the accuracy of classical printing to a precision comparable with optical lithography, creating a low-cost, large-area, high- resolution patterning process.
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Nanoparticle printing with single-particle resolution

TL;DR: This work has developed a novel printing process that enables positioning of sub-100-nm particles individually with high placement accuracy and can create a variety of particle arrangements including lines, arrays and bitmaps, while preserving the catalytic and optical activity of the individual nanoparticles.
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Autonomous microfluidic capillary system.

TL;DR: A microfluidic capillary system (CS) that autonomously transports aliquots of different liquids in sequence: liquids pipetted into the service port of theCS flow unidirectionally through the various sections of the CS, which comprises a 15-pL reaction chamber, into the capillary pump.
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Controlled particle placement through convective and capillary assembly.

TL;DR: It is demonstrated for the first time that the velocity and direction of particles in the suspension can be controlled to perform assembly or disassembly of particles, and a mechanism is proposed that takes into account the relative influences of these parameters on the motion of particles and that describes the influence of temperature on the assembly efficiency.
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Nanoscale Three-Dimensional Patterning of Molecular Resists by Scanning Probes

TL;DR: A scanning probe lithography method based on the local desorption of a glassy organic resist by a heatable probe is presented and demonstrated at a half pitch down to 15 nanometers without proximity corrections and with throughputs approaching those of Gaussian electron beam lithography at similar resolution.