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Guangle Zhou

Researcher at University of Notre Dame

Publications -  21
Citations -  749

Guangle Zhou is an academic researcher from University of Notre Dame. The author has contributed to research in topics: Field-effect transistor & Transistor. The author has an hindex of 11, co-authored 21 publications receiving 710 citations. Previous affiliations of Guangle Zhou include SanDisk & IBM.

Papers
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Proceedings ArticleDOI

Novel gate-recessed vertical InAs/GaSb TFETs with record high I ON of 180 μA/μm at V DS = 0.5 V

TL;DR: In this paper, a gate-recess process was used to achieve a record on-current of 180 μA/μm at V DS = V GS = 0.5 V with an Ion/Ioff ratio of 6 ×103.
Journal ArticleDOI

Performance of AlGaSb/InAs TFETs With Gate Electric Field and Tunneling Direction Aligned

TL;DR: In this article, the currentvoltage characteristics of AlGaSb/InAs staggered-gap n-channel tunnel field effect transistors are simulated in a geometry in which the gate electric field is oriented to be in the same direction as the tunnel junction internal field.
Journal ArticleDOI

AlGaSb/InAs Tunnel Field-Effect Transistor With On-Current of 78 $\mu\hbox{A}/\mu\hbox{m}$ at 0.5 V

TL;DR: In this article, a tunnel field effect transistor (TFET) with a staggered AlGaSb/InAs heterojunction with the tunneling direction oriented in-line with the gate field was shown to achieve a record high on-current of 78 μA/μm in a TFET at room temperature.
Journal ArticleDOI

InGaAs/InP Tunnel FETs With a Subthreshold Swing of 93 mV/dec and $I_{\rm ON}/I_{\rm OFF}$ Ratio Near $\hbox{10}^{6}$

TL;DR: In this article, a vertical n-channel tunnel field effect transistors (TFETs) with tunneling normal to the gate based on an n+ In∞=0.53->;1GaAs/p+ InP heterojunction have been demonstrated to exhibit simultaneously a high ION/IOFF ratio of 6 × 105, a minimum subthreshold swing (SS) of 93 mV/dec, and an on-current of 20 μA/μm at VDS = 0.5 V and a gate swing of 1.75 V at
Journal ArticleDOI

Vertical InGaAs/InP Tunnel FETs With Tunneling Normal to the Gate

TL;DR: In this paper, an n+ In 0.53Ga0.47As/n+ /n+,=0.53- >;1 GaAs/p+ InP heterojunction with tunneling normal to the gate is demonstrated.