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Wan Sik Hwang

Researcher at Korea Aerospace University

Publications -  130
Citations -  6545

Wan Sik Hwang is an academic researcher from Korea Aerospace University. The author has contributed to research in topics: Field-effect transistor & Graphene. The author has an hindex of 26, co-authored 121 publications receiving 5712 citations. Previous affiliations of Wan Sik Hwang include University of Notre Dame & Cornell University.

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High-mobility and low-power thin-film transistors based on multilayer MoS2 crystals

TL;DR: This is the first comprehensive investigation of process-friendly multilayer molybdenum disulphide field-effect transistors and their results provide potentially important implications in the fabrication of high-resolution large-area displays and further scientific investigation of various physical properties expected in other layered semiconductors.
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Broadband graphene terahertz modulators enabled by intraband transitions

TL;DR: It is demonstrated that exceptionally efficient broadband modulation of terahertz waves at room temperature can be realized using graphene with extremely low intrinsic signal attenuation, which is also the first demonstrated graphene-based device enabled solely by intraband transitions.
Patent

Three dimensional semiconductor memory devices and methods of fabricating the same

TL;DR: In this article, the three-dimensional semiconductor memory devices include an electrode structure with sequentially-stacked electrodes disposed on a substrate, semiconductor patterns penetrating the electrode structure, and memory elements including a first pattern and a second pattern interposed between the semiconductor pattern and the electrode structures.
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High-performance, highly bendable MoS2 transistors with high-K dielectrics for flexible low-power systems

TL;DR: Detailed studies of MoS2 transistors on industrial plastic sheets reveal robust electronic properties down to a bending radius of 1 mm which is comparable to previous reports for flexible graphene transistors, and provides guidance for achieving flexible MoS 2 transistors that are reliable at sub-mm bending radius.
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High-voltage field effect transistors with wide-bandgap β-Ga2O3 nanomembranes

TL;DR: In this paper, it is demonstrated that nanomembranes of the widebandgap semiconductor gallium oxide can be used as channels of transistors capable of switching high voltages, and at the same time can be integrated on any platform.