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Hao Bian

Researcher at Xi'an Jiaotong University

Publications -  89
Citations -  2374

Hao Bian is an academic researcher from Xi'an Jiaotong University. The author has contributed to research in topics: Laser & Femtosecond. The author has an hindex of 21, co-authored 86 publications receiving 1855 citations.

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Durability of the tunable adhesive superhydrophobic PTFE surfaces for harsh environment applications

TL;DR: In this article, a bioinspired durable superhydrophobicity with tunable adhesion on polytetrafluoroethylene surfaces is realized via a one-step femtosecond laser irradiation.
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Facile fabrication of true three-dimensional microcoils inside fused silica by a femtosecond laser

TL;DR: In this paper, a facile method for the fabrication of on-chip 3D microcoils inside fused silica is presented. But the main fabrication process involves two steps: (1) creating 3D helical microchannels inside fused silicon using an improved femtosecond laser irradiation assisted by chemical etching (FLICE) technology and (2) conductive treatment by injecting metal gallium into the helical channels.
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Integration of Great Water Repellence and Imaging Performance on a Superhydrophobic PDMS Microlens Array by Femtosecond Laser Microfabrication

TL;DR: In this paper, the authors report a method for fabricating superhydrophobic polydimethylsiloxane (PDMS) MLAs by the combination of femtosecond laser wet etching and femto-cond laser direct writing methods and the resultant surface is composed of a convex MLA and the surrounding rough micro/nanoscale hierarchical structures.
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Femtosecond laser controlling underwater oil-adhesion of glass surface

TL;DR: In this paper, a simple and effective method to fabricate underwater superoleophobic glass surfaces with extremely controllable oil-adhesion through the femtosecond laser microfabrication is presented.
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A high-efficiency three-dimensional helical micromixer in fused silica

TL;DR: In this paper, a 3D helical micromixer was fabricated in fused silica by taking the full advantage of an improved femtosecond laser irradiation followed by chemical etching process.