J
J. Romijn
Researcher at Delft University of Technology
Publications - 33
Citations - 373
J. Romijn is an academic researcher from Delft University of Technology. The author has contributed to research in topics: Electron-beam lithography & Lithography. The author has an hindex of 10, co-authored 33 publications receiving 362 citations.
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Hard-Sphere Crystals with hcp and Non-Close-Packed Structure Grown by Colloidal Epitaxy
TL;DR: It is demonstrated the epitaxial growth of a metastable (with respect to the bulk) hcp crystal as well as any other close-packed stacking sequence of colloidal hard spheres and of a perfect (100)-aligned fcc crystal at certain stretched and compressed lattices.
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Influence of Dissipation on the Coulomb Blockade in Small Tunnel Junctions
TL;DR: In this paper, the effects of charging energy were studied in small-capacitance aluminum tunnel junctions in the normal state, with tunnel resistance Rt between 0.2 and 80 kΩ.
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Epitaxial growth of a colloidal hard-sphere hcp crystal and the effects of epitaxial mismatch on crystal structure
Jacob P. Hoogenboom,Jacob P. Hoogenboom,A. K. van Langen-Suurling,J. Romijn,A. van Blaaderen,A. van Blaaderen +5 more
TL;DR: A detailed three-dimensional analysis based on real-space measurements is performed on crystals structure as a function of template-crystal mismatch, which demonstrates the possibilities of colloidal epitaxy as a model system for studying the effects of a patterned substrate on crystal structure.
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Epitaxial Crystal Growth of Charged Colloids
Jacob P. Hoogenboom,Jacob P. Hoogenboom,Anand Yethiraj,Anand Yethiraj,A. K. van Langen-Suurling,J. Romijn,A. van Blaaderen,A. van Blaaderen +7 more
TL;DR: A pattern of repulsive, charged lines is shown to direct three-dimensional (3D) crystallization in a system of long-range repulsion, density-matched colloids.
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Hydrogen SilsesQuioxane, a high-resolution negative tone e-beam resist, investigated for its applicability in photon-based lithographies
M. Peuker,Michael Lim,Henry I. Smith,R. Morton,A.K. van Langen-Suurling,J. Romijn,E. van der Drift,F.C.M.J.M. van Delft +7 more
TL;DR: In this paper, the authors investigated the sensitivity of hydrogen silsesquioxane (HSQ) for X-ray and photon-based lithography, showing that HSQ is 2.5 times more sensitive than positive tone PMMA.