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Jeffrey T. Glass

Researcher at Duke University

Publications -  245
Citations -  9603

Jeffrey T. Glass is an academic researcher from Duke University. The author has contributed to research in topics: Diamond & Chemical vapor deposition. The author has an hindex of 49, co-authored 240 publications receiving 8933 citations. Previous affiliations of Jeffrey T. Glass include Kobe Steel & North Carolina State University.

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Raman scattering characterization of carbon bonding in diamond and diamondlike thin films

TL;DR: In this article, the atomic bonding configurations of carbon bonding in diamond and diamond-like thin films are explored using Raman scattering, and the general aspects of Raman scatter from composites are presented.
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Polyethylenimine-Enhanced Electrocatalytic Reduction of CO2 to Formate at Nitrogen-Doped Carbon Nanomaterials

TL;DR: Polyethylenimine functions as a co-catalyst by significantly reducing catalytic overpotential and increasing current density and efficiency and appears to help in stabilizing the singly reduced intermediate CO2(•-) and concentrating CO2 in the PEI overlayer.
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Analysis of the composite structures in diamond thin films by Raman spectroscopy.

TL;DR: Ces films ont des structures cristallines composites de types diamant amorphe/graphite contribuent a la diffusion Raman en termes de rapport des hybridations sp 2 and sp 3.
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Characterization of bias-enhanced nucleation of diamond on silicon by invacuo surface analysis and transmission electron microscopy.

TL;DR: A model is proposed to help explain bias-enhanced nucleation on silicon, in hopes that this will improve the understanding of diamond nucleation, in general, and eventually result in the nucleation and growth of better-quality diamond films.
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Textured diamond growth on (100) β‐SiC via microwave plasma chemical vapor deposition

TL;DR: The diamond was characterized by Raman spectroscopy and scanning electron microscopy as discussed by the authors, showing that approximately 50% of the initial diamond nuclei appear to be aligned with the C(001) planes parallel to the SiC(001), and C[110] directions parallel to SiC within 3°.