Showing papers by "Joel Nuno Pinto Borges published in 2018"
TL;DR: CNPq - Conselho Nacional de Desenvolvimento Cientifico e Tecnologico (CFUM-BI-23/2016-UID/ FIS/04650/2013)
Abstract: CNPq - Conselho Nacional de Desenvolvimento Cientifico e Tecnologico(CFUM-BI-23/2016-UID/ FIS/04650/2013)
24 citations
TL;DR: In this paper, the possibility of using aluminium nitride (AlN) as a host dielectric matrix for LSPR films was evaluated, and three sets of nanocomposite Au:AlN films were prepared by magnetron sputtering, followed by thermal annealing to promote the growth of the nanoparticles.
22 citations
TL;DR: This work explored a novel approach to enhance the antibacterial activity of commercial Gutta-percha (GP) cones, the most commonly used core filling materials used in endodontic treatment, by using an argon (Ar) plasma treatment of the GP cone surface followed by the deposition of a ZnO thin film by magnetron sputtering.
21 citations
TL;DR: The goal was to assess the nanostructural characteristics and correlate them with the optical properties of the AuNPs, particularly the localized surface plasmon resonance (LSPR) behavior, and to provide the identification of "hot-spots".
Abstract: Plasmonic Au nanoparticles (AuNPs) embedded into a TiO2 dielectric matrix were analyzed by combining two-dimensional and three-dimensional electron microscopy techniques. The preparation method was reactive magnetron sputtering, followed by thermal annealing treatments at 400 and 600 °C. The goal was to assess the nanostructural characteristics and correlate them with the optical properties of the AuNPs, particularly the localized surface plasmon resonance (LSPR) behavior. High-angle annular dark field-scanning transmission electron microscopy results showed the presence of small-sized AuNPs (quantum size regime) in the as-deposited Au–TiO2 film, resulting in a negligible LSPR response. The in-vacuum thermal annealing at 400 °C induced the formation of intermediate-sized nanoparticles (NPs), in the range of 10–40 nm, which led to the appearance of a well-defined LSPR band, positioned at 636 nm. Electron tomography revealed that most of the NPs are small-sized and are embedded into the TiO2 matrix, whereas...
15 citations
TL;DR: In this article, a magnetron sputtered CrNx thin films with nitrogen concentrations ranging from 17 to 30% were deposited on plasma activated ABS, and two sets of thin films were obtained by varying the N2 flow inside the vacuum chamber and the deposition time.
Abstract: In this work, magnetron sputtered CrNx thin films with nitrogen concentrations ranging from 17 to 30 at.% were deposited on plasma activated ABS. Two sets of thin films were obtained by varying the N2 flow inside the vacuum chamber (series #1) and the deposition time (series #2). The polymer samples were also subjected to plasma treatment in Ar prior to the CrNx thin films' deposition, in order to enhance the adhesion. The fundamental microstructural, chemical and physical properties, as well as the electrochemical and adhesion behavior of the CrNx thin films, were assessed by SEM, XRD, 3D profilometry, RAMAN, colorimetry, OCP measurements and cross-cut tape test. Main results show that high-quality CrNx films with a low percentage of defects were obtained. The CrNx film sputtered with 3 sccm N2 for 20 min was considered to possess the most appropriate brightness, color, electrochemical stability and interfacial adhesion to fit the end-user requirements. Magnetron sputtering is thus a promising alternative to the hazardous chrome plating for an effective metallization of ABS.
10 citations