scispace - formally typeset
J

Juergen A. Schaefer

Researcher at Technische Universität Ilmenau

Publications -  167
Citations -  4200

Juergen A. Schaefer is an academic researcher from Technische Universität Ilmenau. The author has contributed to research in topics: X-ray photoelectron spectroscopy & High resolution electron energy loss spectroscopy. The author has an hindex of 33, co-authored 167 publications receiving 4001 citations. Previous affiliations of Juergen A. Schaefer include Montana State University & University of Kassel.

Papers
More filters
Journal ArticleDOI

Growth of large-area single- and Bi-layer graphene by controlled carbon precipitation on polycrystalline Ni surfaces

TL;DR: In this article, the surface of polycrystalline Ni thin films during atmospheric chemical vapor deposition (CVD) is controlled by controlling both the methane concentration during CVD and the substrate cooling rate during graphene growth to improve the thickness uniformity.
Journal ArticleDOI

Understanding and tuning the epitaxy of large aromatic adsorbates by molecular design

TL;DR: It is proposed that this form of site recognition relies on the existence of a local molecular reaction centre in the extended π-electron system of the molecule, and open the possibility of engineering epitaxial interfaces, as well as other interfacial nanostructures for which specific site recognition is essential.
Journal ArticleDOI

Modeling of graphene metal-oxide-semiconductor field-effect transistors with gapless large-area graphene channels

TL;DR: In this paper, a quasianalytical modeling approach for graphene metal-oxide-semiconductor field effect transistors (MOSFETs) with gapless large-area graphene channels is presented.
Journal ArticleDOI

Viscosity effect on GaInSn studied by XPS

TL;DR: In this article, a home-built device for low (9%) and high (95%) relative humidity for shorter (450 min) and longer (1800 min) time periods was used to measure the viscosity of GaInSn alloys.
Journal ArticleDOI

Adsorption of H, O, and H2O at Si(100) and Si(111) surfaces in the monolayer range: A combined EELS, LEED, and XPS study

TL;DR: In this paper, a series of experiments studying the exposure of hydrogen, oxygen, and water, on the (2×1) surfaces of Si(100) and Si(111), were presented.