J
Jun Hatakeyama
Researcher at Shin-Etsu Chemical
Publications - 330
Citations - 8041
Jun Hatakeyama is an academic researcher from Shin-Etsu Chemical. The author has contributed to research in topics: Resist & Alkyl. The author has an hindex of 43, co-authored 330 publications receiving 8039 citations. Previous affiliations of Jun Hatakeyama include Takeda Pharmaceutical Company.
Papers
More filters
Patent
Resist composition and patterning process
TL;DR: In this article, a resist composition is provided comprising a silicone resin, a photoacid generator, a nitrogen-containing organic compound, and a solvent, which overcomes the problem of a low selective etching ratio between resist film and organic film during oxygen reactive etching.
Patent
Polymers, resist compositions and patterning process
Yuji Harada,Jun Hatakeyama,Yoshio Kawai,Masaru Sasago,Masayuki Endo,Shinji Kishimura,Kazuhiko Maeda,Michitaka Ootani,Haruhiko Komoriya +8 more
TL;DR: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing as discussed by the authors.
Patent
Resist material and pattern forming method using the same
TL;DR: In this article, a 1-20C mono-to- tetra-valent carboxylate of metal selected from sodium, magnesium, chromium, manganese, iron, cobalt, nickel, copper, zinc, silver, tin, antimony, cesium, zirconium and hafnium, or a complex of the metal and β-diketones, was obtained by compounding a polymeric compound prepared by polymerization of a repeating unit of (meth)acrylate, styrene carboxylic acid
Patent
Patterning process and resist composition
TL;DR: In this article, a resist composition comprises a polymer comprising recurring units having an acid labile group and substantially insoluble in alkaline developer, a PAG, a PBG capable of generating an amino group, a quencher for neutralizing the acid from PAG for inactivation, and an organic solvent.
Patent
Chemically amplified positive resist composition
TL;DR: In this article, a chemically amplified positive resist (CRS) was proposed, in which acid labile groups are incorporated into at least some of the hydrogen atoms on the carboxyl or phenolic hydroxyl groups so that the resin becomes insoluble or substantially insoluble in alkali.